• Opto-Electronic Engineering
  • Vol. 44, Issue 2, 216 (2017)
Jie Zheng1, Xianchao Liu1、2, Yuerong Huang1, Yunyue Liu1, Weidong Chen1, and Ling Li1、*
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3969/j.issn.1003-501x.2017.02.011.1 Cite this Article
    Jie Zheng, Xianchao Liu, Yuerong Huang, Yunyue Liu, Weidong Chen, Ling Li. The investigation of focusing characteristic based on double Bowtie nano-lithography structure[J]. Opto-Electronic Engineering, 2017, 44(2): 216 Copy Citation Text show less
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    [2] Shi Xiaolei, Hesselink Lambertus. Mechanisms for enhancing power throughput from planar nano-apertures for near-field optical data storage[J]. Japanese Journal of Applied Physics, 2002, 41(3B): 1632.

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    [5] Sendur K, Challener W. Near-field radiation of bow-tie antennas and apertures at optical frequencies[J]. Journal of Microscopy, 2003, 210(3): 279-283.

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    [10] Wang Yaohui, Yao Na, Zhang Wei, et al. Forming sub-32-nm high-aspect plasmonic spot via bowtie aperture combined with metal-insulator-metal scheme[J]. Plasmonics, 2015, 10(6): 1607-1613.

    [12] Wang Yaohui, He Jiayu, Wang Changtao, et al. Method investigation of direct-writing nanolithography based on enhanced local surface plasmon resonance[J]. Opto-Electronic Engineering, 2016, 43(1): 71-76.

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    Jie Zheng, Xianchao Liu, Yuerong Huang, Yunyue Liu, Weidong Chen, Ling Li. The investigation of focusing characteristic based on double Bowtie nano-lithography structure[J]. Opto-Electronic Engineering, 2017, 44(2): 216
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