[1] Kin Foong Chan, Zhiqiang Feng, Ren Yang et al.. High-resolution maskless lithography[J]. J. Microlith., Microfab. Microsyst., 2003, 2(4): 331~338
[2] Kevin J. Kearneyt, Zoran Ninkov. Characterization of a digital micromirror device for use as an optical mask in imaging and spectroscopy [C]. SPIE, 1996, 3292: 81~92
[3] Yan Shuhua, Dai Yifan, Lü Hai. The gray-tone mask fabrication system based on the SLM[J]. Chin. J. Laser, 2004, 31(1): 45~47
[4] Guo Xiaowei, Du Jinglei, Chen Mingyong et al.. Improving the profiles of Imaging patterns using gray-tone technique in digital photolithography[J]. Opto-Elec. Eng., 2006, 33(11): 31~35
[5] Lars Erdmann, Arnaud Deparnay, Falk Wirth et al.. MOEMS based lithography for the fabrication of microoptical components [C]. SPIE, 2004, 5347: 79~84
[6] Peng Qinjun, Guo Yongkang, Chen Bo et al.. LCD real-time mask technique for fabrication of continuous microoptical elements [J]. Acta Optica Sinica, 2003, 23(2): 220~224
[7] Peng Qinjun, Guo Yongkang, Zeng Yangsu et al.. Real-time grey-tone mask technique for fabrication of microlens array[J]. Chin. J. Laser, 2003, 30(10): 893~896
[8] Xiaowei Guo, Jinglei Du, Yongkang Guo et al.. Simulation of DOE fabrication using DMD-based gray-tone lithography[J]. Microelect. Eng., 2006, 83: 1012~1016
[9] Guo Xiaowei, Du Jinglei, Luo Boliang et al.. Imaging model for DMD-based gray-tone lithography system[J]. Acta Photonica Sinica, 2006, 9(9):123~7
[10] Guo Xiaowei, Du Jinglei, Chen Mingyong et al.. Removal of pixel structures by optimizing the parameters of imaging system in digital photolithography[J]. Acta Photonica Sinica, 2007, 36(3): 462~466
[11] Du Jinglei, Huang Qizhong, Yao Jun et al.. OPC with grey level mask and its computer simulation study[J]. Acta Optica Sinica, 1999, 19(5): 698~702
[12] Tang Xionggui, Yao Xin, Gao Fuhua et al.. Precompensation for nonlinear distortion in thick film photolithography[J]. Acta Optica Sinica, 2006, 26(7): 1032~1036