Mao Lin, Haojun Xu, Xiaolong Wei, Xinmin Han, Yipeng Chang, Min Lin. Attenuation characteristics of electromagnetic wave in inductive coupled plasma based on variation of discharge power[J]. High Power Laser and Particle Beams, 2021, 33(6): 065012
- High Power Laser and Particle Beams
- Vol. 33, Issue 6, 065012 (2021)
Fig. 1. Schematic diagram of a closed plasma hierarchical calculation model
Fig. 2. Schematic diagram and picture of discharge chamber and antenna of flat plate ICP generator
Fig. 3. Electron density measurement and fitting results of closed plasma
Fig. 4. Attenuation of measured electron density values
Fig. 5. Experimental setup and device
Fig. 6. Attenuation of microwave in ICP when the power is 200 W
Fig. 7. Attenuation of microwave in ICP when the power is 300 W
Fig. 8. Attenuation of microwave in ICP plasma when the power is 400 W
Fig. 9. Attenuation of microwave in ICP plasma to when the power is 500 W
Fig. 10. Attenuation of microwave in ICP plasma when the power is 600 W
Fig. 11. Variation of average attenuation in 5.92～6.8 GHz frequency band
Fig. 12. Variation of attenuation peak of 5.92～6.8 GHz frequency band
Fig. 13. Comparison between calculation and experiment of electromagnetic wave attenuation by plasma at 400 W
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