Super-resolution film is one functional film which can overcome the optical diffraction limit, which plays an important role in super-resolution near-field technique. Si-doped Ag film is prepared by co-sputtering method and used as a mask which is measured for super-resolution read-only disk. The largest read out signal′s carrier-to-noise ratio (CNR) of the super-resolution read-only disk is 28 dB under the Ag sputtering power of 55 W, the Si sputtering power of 95 W, the sputtering time of 80 s and the film thickness of 39 nm. Film component is analyzed by X-ray photoelectron spectroscopy (XPS). Film microstructure is demonstrated by scanning electron microscope (SEM). Optical constants and thickness of the film are measured by ellipsometer. The readout mechanism of super-resolution film can be explained with the Ag scattering model. The CNR of the super-resolution disk doesn′t decrease more or less after one hundred thousand times readout.