• Optics and Precision Engineering
  • Vol. 33, Issue 3, 402 (2025)
Bo XUE1,2, Lijun ZHU1,2, Xing SU1,2,*, Li CHEN1,2..., Tao ZHOU1,2, Jianfei ZHANG1,2, Kuo HAI1,2,* and Wen HUANG1,2|Show fewer author(s)
Author Affiliations
  • 1College of Mechanical and Electrical Engineering, Northeast Forestry University, Harbin50040, China
  • 2Sichuan Precision and Ultra-Precision Machining Engineering Technology Center, Chengdu61000,China
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    DOI: 10.37188/OPE.20253303.0402 Cite this Article
    Bo XUE, Lijun ZHU, Xing SU, Li CHEN, Tao ZHOU, Jianfei ZHANG, Kuo HAI, Wen HUANG. Magnetorheological elastomer uniform polishing method for shell components[J]. Optics and Precision Engineering, 2025, 33(3): 402 Copy Citation Text show less
    Schematic diagram of inner surface polishing of thin shell components
    Fig. 1. Schematic diagram of inner surface polishing of thin shell components
    Principle diagram of magnetic field-controlled MRE polishing
    Fig. 2. Principle diagram of magnetic field-controlled MRE polishing
    Schematic diagram of magnetic field-controlled MRE polishing
    Fig. 3. Schematic diagram of magnetic field-controlled MRE polishing
    Pressure cloud diagram of workpiece surface without magnetic field
    Fig. 4. Pressure cloud diagram of workpiece surface without magnetic field
    Schematic diagram of RVE boundary conditions
    Fig. 5. Schematic diagram of RVE boundary conditions
    Cloud diagram of magnetocompressive stress
    Fig. 6. Cloud diagram of magnetocompressive stress
    Magnetocompressive modulus-strain curves
    Fig. 7. Magnetocompressive modulus-strain curves
    Pressure cloud map of workpiece surface
    Fig. 8. Pressure cloud map of workpiece surface
    Pressure curves of polished area
    Fig. 9. Pressure curves of polished area
    Distribution curves of workpiece surface pressure
    Fig. 10. Distribution curves of workpiece surface pressure
    Velocity distribution in polishing area
    Fig. 11. Velocity distribution in polishing area
    Three-dimensional characteristic map of removal function
    Fig. 12. Three-dimensional characteristic map of removal function
    Removal function curves
    Fig. 13. Removal function curves
    Schematic diagram of magnetorheological MRE polishing molding
    Fig. 14. Schematic diagram of magnetorheological MRE polishing molding
    Schematic diagram of superimposing discrete polishing models at various sampling points
    Fig. 15. Schematic diagram of superimposing discrete polishing models at various sampling points
    Magnetron MRE polishing devices
    Fig. 16. Magnetron MRE polishing devices
    Schematic diagram of polishing path
    Fig. 17. Schematic diagram of polishing path
    Surface topography of workpiece after polishing
    Fig. 18. Surface topography of workpiece after polishing
    Radial profile curve of removal volume
    Fig. 19. Radial profile curve of removal volume
    组 分

    相对

    磁导率

    密度/

    (kg⋅m-3

    杨氏模量/

    MPa

    泊松比
    羟基铁粉4 0007 8002.25×1050.35
    硅橡胶193024.660.48
    Table 1. Parameters of 2D RVE model
    工艺参数数值
    磁场强度/T0,0.32
    工件转速n1/(r∙min-160
    抛光盘转速n2/(r∙min-150
    抛光液供速率v/(mL∙min-119
    抛光时间t/min78
    Table 2. Polishing process parameters
    Bo XUE, Lijun ZHU, Xing SU, Li CHEN, Tao ZHOU, Jianfei ZHANG, Kuo HAI, Wen HUANG. Magnetorheological elastomer uniform polishing method for shell components[J]. Optics and Precision Engineering, 2025, 33(3): 402
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