[1] Pal U N, Sharma A K, Soni J S. J. Phys. D: Appl. Phys., 2009, 42: 045213.
[2] Sakai O, Kishimoto Y, Tachibana K. J. Phys. D: Appl. Phys., 2005, 38: 431.
[3] Vincent-Randonnier A, Larigaldie S, Magre P, Sabel’nikov V. Plasma Sources Sci. Tech., 2007, 16: 149.
[4] Fateev A, Leipold F, Kusano Y, et al. Plasma Process. Polym., 2005, 2: 193.
[5] Arakoni R A, Bhoj A N, Kushner M J. J. Phys. D: Appl. Phys., 2007, 40: 2476.
[6] Massines F, Gherardi N, Naudé N, et al. Plasma Phys. Control. Fusion, 2005, 47: B577.
[7] Li Z, Zhao Z, Li X H. Phys. Plasmas, 2013, 20: 013503.
[8] Farouk T I. Ph. D. Dissertation. Drexel: Drexel University, 2009.
[9] Liu J, Niu J H, Xu Y, et al. Acta Phys.-Chim, Sin., 2005, 21: 1352.
[10] Vinogradov I P, Wiesemann K. Plasma sources Sci. Tech., 1997, 6: 302.