A way to make mask patterns by using digital photolithography system based on digital micro-mirror device(DMD) is proposed. Firstly, a cartographic software is applied to make the mask patterns of diffractive optical elements, which include binary grating, Fresnel zone plate and so on. Then, by importing these patterns to DMD and taking advantage of the spatial light modulation characteristics of DMD, the corresponding patterns on chromium plates are sculptured after the process of highly minified projection exposure. Finally, the required mask patterns are produced after the etching and photo resist stripping of the patterns mentioned above. Applying these prepared mask patterns to reduced optical system, patterns with submicron structure will be produced on silicon wafers, which can fully meet the requirement of high resolution. The method unifies the characteristics of the traditional photoetching craft and the DMD digitization hypothesized mask. Compared with the way of laser beam vertical writing and the particle beam etching, the method is convenient, highly effective, and low cost to obtain mask patterns.