Metasurface-based subtractive color filter fabricated on a 12-inch glass wafer using a CMOS platform

Zhengji Xu; Nanxi Li; Yuan Dong; Yuan Hsing Fu; Ting Hu; Qize Zhong; Yanyan Zhou; Dongdong Li; Shiyang Zhu; Navab Singh

doi:10.1364/PRJ.404124

Journals >Photonics Research >Volume 9 >Issue 1 >Page 13 > Article

Photonics Research
Vol. 9, Issue 1, 13 (2021)

Metasurface-based subtractive color filter fabricated on a 12-inch glass wafer using a CMOS platform | On the Cover

Zhengji Xu^1、2, Nanxi Li^1、*, Yuan Dong¹, Yuan Hsing Fu¹, Ting Hu¹, Qize Zhong¹, Yanyan Zhou¹, Dongdong Li¹, Shiyang Zhu¹, and Navab Singh¹

Author Affiliations

¹Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research), Singapore 138634, Singapore

²Current Address: School of Microelectronics Science and Technology, Sun Yat-sen University, Zhuhai 519082, China

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DOI: 10.1364/PRJ.404124 Cite this Article Set citation alerts

Zhengji Xu, Nanxi Li, Yuan Dong, Yuan Hsing Fu, Ting Hu, Qize Zhong, Yanyan Zhou, Dongdong Li, Shiyang Zhu, Navab Singh. Metasurface-based subtractive color filter fabricated on a 12-inch glass wafer using a CMOS platform[J]. Photonics Research, 2021, 9(1): 13 Copy Citation Text

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