Author Affiliations
School of Electrical Engineering, North China University of Science and Technology, Tangshan, Hebei 063210, Chinashow less
Fig. 1. Spot sequence image
Fig. 2. Reverse order continuation of the image. (a) Original image; (b) arrange the columns of the original image in reverse order; (c) combined image of Fig. 2 (a) and Fig. 2 (b); (d) arrange the rows in Fig. 2 (c) in reverse order; (e) image after extension
Fig. 3. Schematic diagram of the threshold function. (a) Hard threshold function; (b) soft threshold function
Fig. 4. Spot effects obtained by different methods. (a) Original spot image; (b) hard threshold denoising method; (c) soft threshold denoising method; (d) our method
Fig. 5. Segmentation results of K-means clustering method. (a) Preprocessed image; (b) halo and plasma dissipated part; (c) effective area of the spot
Fig. 6. Spot image and gray-scale distribution after processing by different methods. (a) Original spot image; (b) preprocessed image; (c) segmented spot image
Fig. 7. Brightness characteristic change curve of spot sequence images
Fig. 8. Brightness change curves of different ablation intervals. (a) 500--600 frame; (b) 1400--1500 frame
Fig. 9. Brightness change curves extracted by different methods. (a) 500--600 frame; (b) 1400--1500 frame
Fig. 10. Denoising results of different methods. (a) 500--600 frame; (b) 1400--1500 frame
Fig. 11. Processing result of the combination of fractal and multi-scale soft threshold denoising. (a) 500--600 frame; (b) 1400--1500 frame
Fig. 12. Shape of the spot during the movement of the processing platform. (a) Movement process from right to left; (b) spot shape at the far right end; (c) movement process from left to right; (d) spot shape at the far left end
Fig. 13. Analysis of brightness and complexity of different power light spots
Number of grooves | Ablation power /mW | Average slot depth /μm |
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39 | 10 | 23 | 39 | 50 | 108 |
|
Table 1. Ablation experimental parameters of silicon microchannels