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    Journals >Acta Optica Sinica >Volume 19 >Issue 11 >Page 1512 > Article
    • Acta Optica Sinica
    • Vol. 19, Issue 11, 1512 (1999)
    Research on Phenomenon of the Super-Resolution in Laser Lithography
    [in Chinese], [in Chinese], and [in Chinese]
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    [in Chinese], [in Chinese], [in Chinese]. Research on Phenomenon of the Super-Resolution in Laser Lithography[J]. Acta Optica Sinica, 1999, 19(11): 1512 Copy Citation Text show less
    References

    [2] Charrier E W, Mack C A. Yielding modeling and enhancement for optical lithography. Proc. SPIE, 1995, 2440:435～447

    [3] Bernard D A, Urbach H P. Thin-film interference effects in photolithography for finite numerical aperture. J. Opt. Soc. Am. (A), 1991, 8(1):123～133

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    [in Chinese], [in Chinese], [in Chinese]. Research on Phenomenon of the Super-Resolution in Laser Lithography[J]. Acta Optica Sinica, 1999, 19(11): 1512
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    Paper Information
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