Electrochemical etching and chemical acid etching are used to optimize the surface texture for improving the conversion efficiency of multicrystalline silicon solar cells. The effect of different current densities on the surface morphology of multicrystalline silicon is studied by the method of electrochemical etching in the HF and CH3CH2OH solution with the volume ratio of 12; then the surface loose structure of the multicrystalline silicon is removed through the chemical acid etching to form high performance surface texture. Surface morphology of multicrystalline silicon is characterized by scanning electron microscopy. The results show that the surface porous structure of the multicrystalline silicon is fabricated after electrochemical etching for 300 s while the favorable current density is 30 mA/cm2. After ultrasonic etching for 60 s in the chemical acid solution with the volume ratio of HF to H2O2 of 41 at room temperature, the surface texture with hole diameter of 2~4 μm and hole depth of 1.5~2 μm is fabricated. It has good light-trap and anti-reflection effects on improving the conversion efficiency of multicrystalline silicon solar cells.