Author Affiliations
1College of Electronic and Optical Engineering & College of Microelectronics, Nanjing University of Posts and Telecommunications, Nanjing, Jiangsu 210023, China;2Bell Honors School, Nanjing University of Posts and Telecommunications, Nanjing, Jiangsu 210023, Chinashow less
Fig. 1. Working principle of MDM-WDM hybrid demultiplexer
Fig. 2. Theoretical model of WDM
Fig. 3. Transmission spectra of theoretical model. (a) Theoretical transmission spectra of each port; (b) local magnification of reflection spectrum
Fig. 4. Three-dimensional structural diagram of MDM-WDM hybrid demultiplexer
Fig. 5. Structural parameters and static field distribution of one-dimensional photonic crystal nanobeam cavity. (a) Structural diagram; (b) hole radius distribution in microcavity area; (c) static field distribution of resonant cavity mode
Fig. 6. Structural diagrams of WDM demultiplexer. (a) Three-dimensional; (b) two-dimensional
Fig. 7. Transmission spectra of WDM demultiplexer. (a) Transmission spectrum at each port; (b) enlarge views of transmission spectra
Fig. 8. Static field distributions of different incident light in WDM demultiplexing process. (a) 1570.0 nm; (b) 1573.2 nm
Fig. 9. Relationship between performance of WDM demultiplexer and Δr. (a) Insertion loss at each wavelength versus Δr; (b) channel crosstalk at each wavelength versus Δr
Fig. 10. Structural parameters and transmission spectra of MDM demultiplexer. (a) Effective refractive index map of nanowire waveguides; (b) three-dimensional structural diagram; (c) side view of three-dimensional structure; (d) transmission spectra; (e) different mode conversion diagrams
Fig. 11. Relationship between performance of MDM demultiplexer and Lc. (a) Insertion loss of each mode versus Lc; (b) channel crosstalk of each mode versus Lc
Fig. 12. Transmission spectra of ports O3 and O4 in demultiplexing process. (a) Hole is not fine-tuned; (b) hole is fine-tuned
Fig. 13. Transmission spectra of each mode in demultiplexing process. (a) TE0; (b) TE1
Fig. 14. Static field distribution in demultiplexing process. (a) TE0 at 1570.0 nm; (b) TE0 at 1573.2 nm; (c) TE1 at 1570.0 nm; (d) TE1 at 1573.2 nm
Port | TE0 | TE1 |
---|
@1570.0 nm | @1573.2 nm | @1570.0 nm | @1573.2 nm |
---|
O3 | 0.37 dB | | | | O4 | | 0.15 dB | | | O5 | | | 0.37 dB | | O6 | | | | 0.13 dB |
|
Table 1. Insertion loss of each mode
Port | TE0 | TE1 |
---|
@1570.0 nm | @1573.2 nm | @1570.0 nm | @1573.2 nm |
---|
O3 | | -22.7 dB | -35.8 dB | -36.4 dB | O4 | -19.2 dB | | -30.3 dB | -29.8 dB | O5 | -35.9 dB | -32.6 dB | | -23.0 dB | O6 | -43.7 dB | -39.3 dB | -18.4 dB | |
|
Table 2. Channel crosstalk of each mode