• Infrared and Laser Engineering
  • Vol. 49, Issue S1, 20200114 (2020)
Liu Xuchao1、2, Cheng Hongling3, Wang Zhimin1、*, Peng Qinjun1, and Xu Zuyan1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    DOI: 10.3788/irla20200114 Cite this Article
    Liu Xuchao, Cheng Hongling, Wang Zhimin, Peng Qinjun, Xu Zuyan. Optically end-pumped rubidium-vapor laser with 693 Woutput peak-power[J]. Infrared and Laser Engineering, 2020, 49(S1): 20200114 Copy Citation Text show less

    Abstract

    A rubidium-vapor laser pumped by a pulsed titanium sapphire laser was presented to investigate the dynamics of diode-pumped rubidium-vapor lasers. The vapor cell was filled with 70 kPa methane and 6 atm He at room temperature. The laser generated an average power of 208 mW, according to the conversion efficiency of 19 % from absorbed 779.8 nm pump light to 795 nm laser. High peak power of 693 W rubidium-vapor laser was achieved with a 100 ns (FWHM) pulse width at a repetition rate of 3 kHz. Our experiments illustrate that the reabsorption of the Rb-He-CH4 mixtures will be a significant limitation in DPALs with the high pump power intensity. It can be deduced that the pump power intensity threshold of the Rb-He-CH4 system (6 atm He, 70 kPa CH4 at room temperature) at 418 K should be >200.6 kW/cm2 if LDs with a linewidth of 0.9 nm are adopted as the pump source.
    Liu Xuchao, Cheng Hongling, Wang Zhimin, Peng Qinjun, Xu Zuyan. Optically end-pumped rubidium-vapor laser with 693 Woutput peak-power[J]. Infrared and Laser Engineering, 2020, 49(S1): 20200114
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