[1] Joseph Ladislas Wiza. Microchannel plate dectors[J]. Nuclear Instruments and Methods, 1979, 162: 587-601.

[3] Markku L, Mikko R. Atomic layer deposition chemistry: recent developments and future challenges[J]. Angewandte Chemie, 2003, 42(45): 5548-5554.

[4] George S M. Atomic layer deposition: an overview[J]. Chemical Reviews, 2010, 110(1): 111-131.

[5] Ritala M, Kukli K, Rahtu A, et al. Atomic layer deposition of oxide thin films with metal alkoxides as oxygen sources[J]. Science, 2000, 288(5464): 319-321.

[6] Gordon R G, Hausmann D, Kim E, et al. A kinetic model for step coverage by atomic Layer deposition in narrow holes or trenches[J]. Chemical Vapor Deposition, 2003, 9(2): 73-78.

[7] Adomaitis, Raymond A. A ballistic transport and surface reaction model for simulating atomic layer deposition processes in high-aspect-ratio nanopores[J]. Chemical Vapor Deposition, 2011, 17(10-12): 353-365.

[9] Elam J W, Routkevitch D, Mardilovich P P, et al. Conformal coating on ultrahigh-aspect-ratio nanopores of anodic alumina by atomic layer deposition[J]. Chemistry of Materials, 2003, 15(18): 3507-3517.

[10] Kucheyev S O, Biener J, Baumann T F, et al. Mechanisms of atomic layer deposition on substrates with ultrahigh aspect ratios[J]. Langmuir the Acs Journal of Surfaces & Colloids, 2008, 24(3): 943-948.

[11] Liu Shulin, Deng Guangxu, Yan Cheng, et al. Experiment research on relation between MCP gain and electron energy while first collision[J]. Infrared Technology, 2011, 33(6): 354-356. (in Chinese)

[12] Gao Xiumin, Cai Chunping. Secondary electron emission coefficient of MCP glass.[J]. Journal of Applied Optics, 1998, 4: 9-17. (in Chinese)