• Journal of Infrared and Millimeter Waves
  • Vol. 35, Issue 1, 116 (2016)
DONG Zheng-Qiong*, LIU Shi-Yuan, CHEN Xiu-Guo*, SHI Ya-Ting, ZHANG Chuan-Wei, and JIANG Hao
Author Affiliations
  • [in Chinese]
  • show less
    DOI: 10.11972/j.issn.1001-9014.2016.01.019 Cite this Article
    DONG Zheng-Qiong, LIU Shi-Yuan, CHEN Xiu-Guo*, SHI Ya-Ting, ZHANG Chuan-Wei, JIANG Hao. Optimization of measurement configuration in optical scatterometry for one-dimensional nanostructures based on sensitivity analysis[J]. Journal of Infrared and Millimeter Waves, 2016, 35(1): 116 Copy Citation Text show less
    References

    [1] POSTEK M T, LYONS K W. Instrumentation, metrology, and standards: key elements for the future of nanomanufacturing, Instrumentation, Metrology, and Standards for Nanomanufacturing [C]. California, USA: Proceedings of SPIE, 2007, 6648: 664802.

    [2] POSTEK M T, LYONS K W. Metrology at the nanoscale: what are the grand challenges Instrumentation, Metrology, and Standards for Nanomanufacturing II [C]. California, USA: Proceedings of SPIE, 2008, 7042: 704202.

    [3] HANSEN H N, CARNEIRO K, HAITJEMA H, et al. Dimensional micro and nanometrology [J]. CIRP Annals-Manufacturing Technology, 2006, 55(2): 721-743.

    [4] RAYMOND C. Overview of scatterometry applications in high volume silicon manufacturing, Characterization and Metrology for ULSI Technology [C]. Texas, USA: AIP Conference Proceedings, 2005, 788: 394-402.

    [5] WEIDNER P, KASIC A, HINGST T, et al. Model-free and model-based methods for dimensional metrology during the lifetime of a product, Ninth International Symposium on Laser Metrology [C]. Singapore, Proceedings of SPIE, 2008, 7155: 71550Y.

    [6] FOLDYNA M, MARTINO A D, CAUREL E G, et al. Critical dimension of biperiodic gratings determined by spectral ellipsometry and Mueller matrix polarimetry [J]. European Physics Journal Applied Physics, 2008, 42(3): 351-359.

    [7] DONG Zheng-Qiong, LIU Shi-Yuan, CHEN Xiu-Guo et al. Determination of an optimal measurement configuration in optical scatterometry using global sensitivity analysis [J]. Thin Solid Films, 2014, 562: 16-23.

    [8] CHEN Xiu-Guo, LIU Shi-Yuan, ZHANG Chuan-Wei, et al. Measurement configuration optimization for accurate grating reconstruction by Mueller matrix polarimetry [J]. Journal of Micro/Nanolithography, MEMS, and MOEMS, 2013, 12(3): 033013.

    [9] LOGOFATU P C. Sensitivity analysis of grating parameter estimation [J]. Applied Optics, 2002, 41(34): 7179-7186.

    [10] KU Yi-Sha, WANG Shih-Chun, SHYU Deh-Ming, et al. Scatterometry-based metrology with feature region signature matching [J]. Optics Express, 2006, 14(9): 8482-8491.

    [11] VAGOS P, HU Jiang-Tao, LIU Zhuan, et al. Uncertainty and sensitivity analysis and its applications in OCD measurement, Metrology, Inspection, and Process Control for Microlithography XXIII [C], California, USA: Proceedings of SPIE, 2009, 7272: 72721N.

    [12] HUANG Hsu-Ting, KONG Wei, TERRY F L. Normal-incidence spectroscopic ellipsometry for critical dimension monitoring [J]. Applied Physics Letters, 2001, 78(25): 3983-3985.

    [13] NIU Xin-Hui, JAKATDAR N, BAO Jun-Wei, et al. Specular spectroscopic scatterometry [J]. IEEE Transactions on Semiconductor Manufacturing, 2001, 14(2): 97-111.

    [14] MOHARAM M G, GRANN E B, POMMET D A. Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings [J]. Journal of the Optical Society of America A, 1995, 12(5): 1068-1076.

    [15] LIU Shi-Yuan, MA Yuan, CHEN Xiu-Guo, et al, Estimation of the convergence order of rigorous coupled-wave analysis for binary gratings in optical critical dimension metrology [J]. Optical Engineering, 2012, 51(8): 081504.

    [16] ZHU Jin-Long, LIU Shi-Yuan, ZHANG Chuan-Wei, et al. Identification and reconstruction of diffraction structures in optical scatterometry using support vector machine method [J]. Journal of Micro/Nanolithography, MEMS, and MOEMS, 2013, 12(1): 013004.

    [17] ZHANG Chuan-Wei. LIU Shi-Yuan, SHI Tie-Lin, et al. Fitting-determined formulation of effective medium approximation for 3D trench structures in model-based infrared reflectrometry [J]. Journal of the Optical Society of America A, 2011, 28(2): 263-271.

    [19] LIU Shi-Yuan, CHEN Xiu-Guo, ZHANG Chuan-Wei. Development of a broadband Mueller matrix ellipsometer as a powerful tool for nanostructure metrology [J]. Thin Solid Films, 2015, 584: 176-185.

    [20] CHEN Xiu-Guo, ZHANG Chuan-Wei, LIU Shi-Yuan, et al. Mueller matrix ellipsometric detection of profile asymmetry in nanoimprinted grating structures [J]. Journal of Applied Physics, 2014, 116(19): 194305.

    [21] HERZINGER C M, JOHS B, MCGAHAN W A, et al. Ellipsometric determination of optical constants for silicon and thermally grown silicon dioxide via a multi-sample, multi-wavelength, multi-angle investigation [J]. Journal of Applied Physics, 1998, 83(6): 3323-3336.

    [22] FOROUHI A R, BLOOMER I. Optical properties of crystalline semiconductors and dielectrics [J]. Physical Review B, 1988, 38(3): 1865-1874.

    [23] JELLISON JR G E, MODINE F A. Parameterization of the optical functions of amorphous materials in the interband region [J]. Applied Physics Letters, 1996, 69(3): 371-373.0123

    DONG Zheng-Qiong, LIU Shi-Yuan, CHEN Xiu-Guo*, SHI Ya-Ting, ZHANG Chuan-Wei, JIANG Hao. Optimization of measurement configuration in optical scatterometry for one-dimensional nanostructures based on sensitivity analysis[J]. Journal of Infrared and Millimeter Waves, 2016, 35(1): 116
    Download Citation