• Opto-Electronic Engineering
  • Vol. 33, Issue 1, 1 (2006)
[in Chinese]1, [in Chinese]1, and [in Chinese]1、2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: Cite this Article
    [in Chinese], [in Chinese], [in Chinese]. Imaging interferometric lithography with bidirection biased illumination[J]. Opto-Electronic Engineering, 2006, 33(1): 1 Copy Citation Text show less
    References

    [5] Xiaolan CHEN,S.R.J.BRUECK.Imaging interferometric lithography for arbitrary patterns[J].SPIE Proceedings,1997,3331:214-224.

    [6] S.R.J.BRUECK.Imaging interferometric lithography[J].Microlithography World,1998,Winter:2-10.

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    [in Chinese], [in Chinese], [in Chinese]. Imaging interferometric lithography with bidirection biased illumination[J]. Opto-Electronic Engineering, 2006, 33(1): 1
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