Development of mask for scattering with angular limitation projection electron-beam lithography

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Opto-Electronic Engineering >Volume 31 >Issue 4 >Page 13 > Article

Opto-Electronic Engineering
Vol. 31, Issue 4, 13 (2004)

Development of mask for scattering with angular limitation projection electron-beam lithography

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]

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[in Chinese]

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DOI: Cite this Article

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Development of mask for scattering with angular limitation projection electron-beam lithography[J]. Opto-Electronic Engineering, 2004, 31(4): 13 Copy Citation Text

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References

[2] SOMEDA Y , SATOH H , SOHDA Y , et al. Electron beam cell projection lithography: Its accuracy and its throughput [J]. J. Vac. Sci. Technol. B, 1994, 12(6): 3399-3403.

[4] LIDDLE J A , HARRIOTT L R , NOVEMBRE A E , el al. SCALPEL: A Projection Electron-Beam Approach to Sub-Optical Lithography [R] . New Jersey: Bell Laboratories of Lucent Technologies, 1999.

[5] GALE Morrison. NGL Players Take the Litho Field [EB/OL]. http://www.reed-electronics.com/ electronicnews/article/ CA70113 stt =001&text=ngl. Electronic News, 1999-07 / 2003-12.

[6] BOGART G R, NOVEMBRE A E, KORNBLIT A. 200mm SCALPEL Mask Development [R]. New Jersey: Bell Laboratories of Lucent Technologies, 1999.

CLP Journals

[1] Yu Changsong, Xiang Yang. Research Progress of Pinhole Mask Technology of Point Diffraction Interferometer[J]. Laser & Optoelectronics Progress, 2013, 50(3): 30004

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