• Acta Optica Sinica
  • Vol. 42, Issue 11, 1134003 (2022)
Runze Qi, Jinlong Zhang, Jiali Wu, Shuangying Li, Qiushi Huang, Zhong Zhang, and Zhanshan Wang*
Author Affiliations
  • Key Laboratory of Advanced Micro-Structured Materials, Ministry of Education, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
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    DOI: 10.3788/AOS202242.1134003 Cite this Article Set citation alerts
    Runze Qi, Jinlong Zhang, Jiali Wu, Shuangying Li, Qiushi Huang, Zhong Zhang, Zhanshan Wang. Thin Film Optical Elements in Extreme Ultraviolet and Vacuum Ultraviolet[J]. Acta Optica Sinica, 2022, 42(11): 1134003 Copy Citation Text show less

    Abstract

    Extreme ultraviolet (EUV) and vacuum ultraviolet (VUV) high-performance thin film optical elements greatly improve the capability of high-precision observation, and contribute to the development of astronomy, materials, physics, and other disciplines. According to the different application requirements as well as physical and chemical properties of materials, the Institute of Precision Optical Engineering (IPOE) in Tongji University has successfully developed amounts of high-performance thin film mirrors, such as Mg/SiC, Sc/Si, Yb/Al, Al+LiF+eMgF2, and LaF3/MgF2, which can meet the requirements of application in whole EUV and VUV wavelength ranges (25--200 nm). These mirrors are already applied to domestic large-scale scientific instrument (from ground to space). This paper briefly introduces the research progress obtained by IPOE during the development of EUV and VUV thin film optical elements.
    Runze Qi, Jinlong Zhang, Jiali Wu, Shuangying Li, Qiushi Huang, Zhong Zhang, Zhanshan Wang. Thin Film Optical Elements in Extreme Ultraviolet and Vacuum Ultraviolet[J]. Acta Optica Sinica, 2022, 42(11): 1134003
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