Three-dimensional polarization aberration of deep ultraviolet lithographic projection lens

He Wenjun; Jia Wentao; Feng Wentian; Zheng Yang; Liu Zhiying; Fu Yuegang

doi:10.3788/irla201847.0818006

[1] Yao Changcheng, Gong Yan. Research on temperature distribution of deep ultraviolet lithographic projection objective[J]. Chinese Journal of Lasers, 2016, 43(5): 0516001. (in Chinese)

[2] McIntyre G R, Kye J, Levinson H. Polarization aberrations in hyper-numerical-aperture projection printing: a comparison of various representations[J]. J Microlithogr Microfabr Microsyst, 2006, 5(3): 033001.

[3] Kye J, McIntyre G R, Norihiro Y, et al. Polarization aberration analysis in optical lithography systems [C]//SPIE, 2006, 6154: 61540E.

[4] Geh B, Ruoff J, Zimmermann J, et al. The impact of projection lens polarization properties on lithographic process at hyper-NA[C]// SPIE, 2007, 6520: 65200F.

[5] Ruoff J, Totzeck M. Using orientation Zernike polynomials to predict the imaging performance of optical systems with birefringent and partly polarizing components[C]//SPIE, 2010, 7652: 76521T.

[6] Wang Xia, Xia Runqiu, Jin Weiqi, et al. Technology progress of infrared polarization imaging detection[J]. Infrared and Laser Engineering, 2014, 43(10): 3175-3182. (in Chinese)

[7] Yamamoto N, Kye J, Levinson H J. Polarization aberration analysis using Pauli-Zernike representation in: proceedings of the advanced lithography[C]//SPIE, 2007, 6520: 65200Y.

[8] Zhou Qiang, Zhao Jufeng, Feng Huajun, et al. Infrared image enhancement using polarization imaging[J]. Infrared and Laser Engineering, 2014, 43(1): 39-47. (in Chinese)

[9] Xu X, Huang W, Xu M. Orthogonal polynomials describing polarization aberration for rotationally symmetric optical systems [J]. Optics Express, 2015, 23(21): 27911-27919.

[10] Chipman R A. Mechanics of polarization ray tracing [J]. Opt Eng, 1995, 34: 1636-1645.

[11] Li S F. Jones-matrix analysis with Pauli-matrices: application to ellipsometry [J]. JOSA A, 2000, 17(5): 920-926.

[12] He W J, Fu Y G, Liu Z Y, et al. Three-dimensional polarization aberration functions in optical system based on three-dimensional polarization ray-tracing calculus [J]. Optics Communications, 2017, 387: 128-134.

[13] McGuire J P, Chipman R A. Polarization aberrations. 1. Rotationally symmetric optical systems [J]. Applied Optics, 1994, 33(22): 5080-5100.

[14] McGuire J P, Chipman R A, Polarization aberrations. 2. Tilted and decentered optical systems [J]. Applied Optics, 1994, 33(22): 5101-5107.

[15] Wang J, Li Y. Three-dimensional polarization aberration in hyper-numerical aperture lithography optics [C]//SPIE, 2012, 8326: 832624.

[16] Yun G, Crabtree K, Chipman R A. Three-dimensional polarization ray-tracing calculus I: definition and diattenuation [J]. Applied Optics, 2011, 50(18): 2855-2865.

[17] Yun G, Crabtree K, Chipman R A. Three-dimensional polarization ray-tracing calculus II: retardance [J]. Applied Optics, 2011, 50(18): 2866-2874.

[18] He W J, Fu Y G, Zheng Y, et al. Polarization properties of a corner-cube retroreflector with three dimensional polarization ray-tracing calculus [J]. Applied Optics, 2013, 52(19): 4527-4530.