[1] Yin Chunyong. Modern Interferogrometric Measuring Technique[M]. Tianjin:Tianjin University Press,1997
[2] Chengchih Hsu,Juyi Lee,Derchin Su. Thickness and optical constants measurement of thin film growth with circular heterodyne interferometry[J]. Thin Solid Films,2005,491(1-2):91-95
[3] P. Hlubina,D. Ciprian,J. Lunacek et al.. Thickness of SiO2 thin film on silicon wafer measured by dispersive white-light spectral interferometry[J]. Appl. Phys. B,2006,84(3):511-516
[4] James J. Talamonti,Richard B. Kay,Danny J. Krebs. Numerical model estimating the capabilities and limitations of the fast Fourier transform technique in absolute interferometry[J]. Appl. Opt.,1996,35(13):2182-2191
[5] Su Junhong. Interferogram region spreading technology in spatial domain[J]. Infrared and Laser Engineering,2003,34(4):397-400