• Chinese Journal of Lasers
  • Vol. 36, Issue s2, 252 (2009)
Ge Jinman* and Su Junhong
Author Affiliations
  • [in Chinese]
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    DOI: 10.3788/cjl200936s2.0252 Cite this Article Set citation alerts
    Ge Jinman, Su Junhong. Processing Technology of Interferogram of Thin Film Thickness Measurement[J]. Chinese Journal of Lasers, 2009, 36(s2): 252 Copy Citation Text show less
    References

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    [2] Chengchih Hsu,Juyi Lee,Derchin Su. Thickness and optical constants measurement of thin film growth with circular heterodyne interferometry[J]. Thin Solid Films,2005,491(1-2):91-95

    [3] P. Hlubina,D. Ciprian,J. Lunacek et al.. Thickness of SiO2 thin film on silicon wafer measured by dispersive white-light spectral interferometry[J]. Appl. Phys. B,2006,84(3):511-516

    [4] James J. Talamonti,Richard B. Kay,Danny J. Krebs. Numerical model estimating the capabilities and limitations of the fast Fourier transform technique in absolute interferometry[J]. Appl. Opt.,1996,35(13):2182-2191

    [5] Su Junhong. Interferogram region spreading technology in spatial domain[J]. Infrared and Laser Engineering,2003,34(4):397-400

    [6] Hui Mei,Wang Dongsheng,Li Qingxiang et al.. Phase unwrapping method based on the solution of discrete Poisson equation[J]. Acta Optica Sinica,2003,23(10):1245-1249

    Ge Jinman, Su Junhong. Processing Technology of Interferogram of Thin Film Thickness Measurement[J]. Chinese Journal of Lasers, 2009, 36(s2): 252
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