• Chinese Journal of Lasers
  • Vol. 36, Issue s2, 252 (2009)
Ge Jinman* and Su Junhong
Author Affiliations
  • [in Chinese]
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    DOI: 10.3788/cjl200936s2.0252 Cite this Article Set citation alerts
    Ge Jinman, Su Junhong. Processing Technology of Interferogram of Thin Film Thickness Measurement[J]. Chinese Journal of Lasers, 2009, 36(s2): 252 Copy Citation Text show less

    Abstract

    Measuring the thin film thickness by modern interferometry has advantages of the whole test,high precision and non-contact measurement,the kernel of which is to obtain necessary surface shape and parameter by processing interferogram with reasonable algorithms. The pre-treatment of the interferogram is the most crucial and a basal part,which includes the edge identification of based on mathematical morphology,regional extension based on the 2-D fast Fourier transform (FFT) and unwrapped and wrapped phase based on the non-weighted least squares algorithm for DCT. At the result,surface distribution can be obtained,which lays the groundwork for getting the thin films thickness correctly. In this paper,the image collection of the SiO2 film and the pretreatment of interferogram is performed. The result indicates that it is basically consistent to the result tested by Zygo interferometer.
    Ge Jinman, Su Junhong. Processing Technology of Interferogram of Thin Film Thickness Measurement[J]. Chinese Journal of Lasers, 2009, 36(s2): 252
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