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    Journals >Acta Optica Sinica >Volume 19 >Issue 2 >Page 201 > Article
    • Acta Optica Sinica
    • Vol. 19, Issue 2, 201 (1999)
    Parameter Study of Optical-Field Ionized Kr IX Plasma
    [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Parameter Study of Optical-Field Ionized Kr IX Plasma[J]. Acta Optica Sinica, 1999, 19(2): 201 Copy Citation Text show less

    Abstract

    Optical-field ionized plasma parameters are studied to find the optimum laser intensity for production of KrIX plasma suitable for the generation of collisionally excited XUV laser at 31.9 nm.

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Parameter Study of Optical-Field Ionized Kr IX Plasma[J]. Acta Optica Sinica, 1999, 19(2): 201
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    Paper Information
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