• Journal of Semiconductors
  • Vol. 42, Issue 11, 112002 (2021)
Xiaorui Zhang1,3, Huiping Zhu2, Song’ang Peng1,2, Guodong Xiong2,3..., Chaoyi Zhu1,3, Xinnan Huang1,3, Shurui Cao1,3, Junjun Zhang2,3, Yunpeng Yan1,3, Yao Yao1,4, Dayong Zhang1, Jingyuan Shi1, Lei Wang2, Bo Li2 and Zhi Jin1|Show fewer author(s)
Author Affiliations
  • 1High-Frequency High-Voltage Device and Integrated Circuits R&D Center, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
  • 2Key Laboratory of Science and Technology on Silicon Devices, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
  • 3University of Chinese Academy of Sciences, Beijing 100049, China
  • 4Department of Chemistry, City University of Hong Kong, Hong Kong 999077, China
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    DOI: 10.1088/1674-4926/42/11/112002 Cite this Article
    Xiaorui Zhang, Huiping Zhu, Song’ang Peng, Guodong Xiong, Chaoyi Zhu, Xinnan Huang, Shurui Cao, Junjun Zhang, Yunpeng Yan, Yao Yao, Dayong Zhang, Jingyuan Shi, Lei Wang, Bo Li, Zhi Jin. Radiation-hardened property of single-walled carbon nanotube film-based field-effect transistors under low-energy proton irradiation[J]. Journal of Semiconductors, 2021, 42(11): 112002 Copy Citation Text show less
    (Color online) Structure and properties of the SWCNT-film-based FET. (a) AFM morphologic image showing the SWCNT film deposited on the Si/SiO2 substrate. The inset is the optical image of a SWCNT FET, of which the channel length is 10 μm and the width is 20 μm. (b) Typical transfer charateristics curves of the SWCNT FET before irradiation at VDS = –10 V. (c) Schematic diagram of the low-energy charged particle irradiation simulation test device composed of an ionization chamber, accelerator and irradiation chamber. (d) Schematic showing the total ionizing dose (TID) and displacement damage effect in the SWCNT FET induced by proton irradiation.
    Fig. 1. (Color online) Structure and properties of the SWCNT-film-based FET. (a) AFM morphologic image showing the SWCNT film deposited on the Si/SiO2 substrate. The inset is the optical image of a SWCNT FET, of which the channel length is 10 μm and the width is 20 μm. (b) Typical transfer charateristics curves of the SWCNT FET before irradiation at VDS = –10 V. (c) Schematic diagram of the low-energy charged particle irradiation simulation test device composed of an ionization chamber, accelerator and irradiation chamber. (d) Schematic showing the total ionizing dose (TID) and displacement damage effect in the SWCNT FET induced by proton irradiation.
    (Color online) Simulation results of (a) the distribution of protons in the source/drain region (Au/Pd/Ti/SWCNT/SiO2/Si), (b) the number of vacancies in the source/drain region (Au/Pd/Ti/SWCNT/SiO2/Si), (c) distribution of protons in the channel region (SWCNT/SiO2/Si), and (d) the number of vacancies in the channel region (SWCNT/SiO2/Si) by SRIM. The energy of the protons is 150 keV. The inset is the illustration of the simulation region, including the source/drain contact region and the SWCNT channel region.
    Fig. 2. (Color online) Simulation results of (a) the distribution of protons in the source/drain region (Au/Pd/Ti/SWCNT/SiO2/Si), (b) the number of vacancies in the source/drain region (Au/Pd/Ti/SWCNT/SiO2/Si), (c) distribution of protons in the channel region (SWCNT/SiO2/Si), and (d) the number of vacancies in the channel region (SWCNT/SiO2/Si) by SRIM. The energy of the protons is 150 keV. The inset is the illustration of the simulation region, including the source/drain contact region and the SWCNT channel region.
    Simulation result of the energy loss in the metal/CNT contact and channel region of the CNT-layer performed by GEANT 4 with four different proton irradiation fluences of 5 × 1012, 5 × 1013, 5 × 1014 and 1 × 1015 p/cm2.
    Fig. 3. Simulation result of the energy loss in the metal/CNT contact and channel region of the CNT-layer performed by GEANT 4 with four different proton irradiation fluences of 5 × 1012, 5 × 1013, 5 × 1014 and 1 × 1015 p/cm2.
    Raman spectra of SWCNT FETs before and after proton irradiation with four different proton fluences of 5 × 1012, 5 × 1013, 5 × 1014 and 1 × 1015 p/cm2. (a) Single point Raman spectra of SWCNT FETs with different proton fluences, in which the G peaks are normalized. (b) Statistical study on the ratio of the D peak intensity to the G peak intensity (ID/IG) with different proton fluences. Each sample has 121 test points, which are obtained by Raman mapping. The test area is 5 × 5 μm2 and the spacing is 0.5 μm.
    Fig. 4. Raman spectra of SWCNT FETs before and after proton irradiation with four different proton fluences of 5 × 1012, 5 × 1013, 5 × 1014 and 1 × 1015 p/cm2. (a) Single point Raman spectra of SWCNT FETs with different proton fluences, in which the G peaks are normalized. (b) Statistical study on the ratio of the D peak intensity to the G peak intensity (ID/IG) with different proton fluences. Each sample has 121 test points, which are obtained by Raman mapping. The test area is 5 × 5 μm2 and the spacing is 0.5 μm.
    (Color online) (a) Typical transfer characteristics curves of the SWCNT FETs at VDS = –10 V with different proton fluences. (b) Threshold voltage (Vth) values extracted by the Y-function method with different proton fluences. (c) Band structure of SWCNT with metal before and after proton irradiation at the on- (left) and off-state (right). (d) Hysteresis in typical transfer characteristics curves with different proton fluences at VDS = –10 V.
    Fig. 5. (Color online) (a) Typical transfer characteristics curves of the SWCNT FETs at VDS = –10 V with different proton fluences. (b) Threshold voltage (Vth) values extracted by the Y-function method with different proton fluences. (c) Band structure of SWCNT with metal before and after proton irradiation at the on- (left) and off-state (right). (d) Hysteresis in typical transfer characteristics curves with different proton fluences at VDS = –10 V.
    Statistics measurements of (a) the threshold voltage (Vth), (b) rate of on-current (Ion) change, (c) rate of off-current (Ioff) change, (d) rate of on/off ratio change, (e) rate of mobility change, and (f) subthreshold swing (SS) with four different proton irradiation fluences of 5 × 1012, 5 × 1013, 5 × 1014 and 1 × 1015 p/cm2.
    Fig. 6. Statistics measurements of (a) the threshold voltage (Vth), (b) rate of on-current (Ion) change, (c) rate of off-current (Ioff) change, (d) rate of on/off ratio change, (e) rate of mobility change, and (f) subthreshold swing (SS) with four different proton irradiation fluences of 5 × 1012, 5 × 1013, 5 × 1014 and 1 × 1015 p/cm2.
    (Color online) TLM measurements of SWCNT FETs before and after proton irradiation with four different proton fluences of 5 × 1012, 5 × 1013, 5 × 1014 and 1 × 1015 p/cm2. (a) Typical current–voltage curves of a complete SWCNT TLM test structure before proton irradiation at VBG = –10 V. Inset is the optical image of a SWCNT TLM test structure consisting of several FETs, which have the same channel width (7 μm) and different channel length (4, 6, 10, 14, 18, 22, 28 and 35 μm, respectively). (b) Length-dependent total resistances of SWCNT FETs with different proton fluences.
    Fig. 7. (Color online) TLM measurements of SWCNT FETs before and after proton irradiation with four different proton fluences of 5 × 1012, 5 × 1013, 5 × 1014 and 1 × 1015 p/cm2. (a) Typical current–voltage curves of a complete SWCNT TLM test structure before proton irradiation at VBG = –10 V. Inset is the optical image of a SWCNT TLM test structure consisting of several FETs, which have the same channel width (7 μm) and different channel length (4, 6, 10, 14, 18, 22, 28 and 35 μm, respectively). (b) Length-dependent total resistances of SWCNT FETs with different proton fluences.
    Xiaorui Zhang, Huiping Zhu, Song’ang Peng, Guodong Xiong, Chaoyi Zhu, Xinnan Huang, Shurui Cao, Junjun Zhang, Yunpeng Yan, Yao Yao, Dayong Zhang, Jingyuan Shi, Lei Wang, Bo Li, Zhi Jin. Radiation-hardened property of single-walled carbon nanotube film-based field-effect transistors under low-energy proton irradiation[J]. Journal of Semiconductors, 2021, 42(11): 112002
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