[1] L. P. Ghislain, V. B. Elings, K. B. Crozier et al.. Near-field photolithography with a solid immersion lens［J］. Appl. Phys. Lett., 1999, 74(4): 501～503

[2] T. D. Milster, J. S. Jo, K. Hirota. Roles of propagating and evanescent waves in solid immersion system［J］. Appl. Opt., 1999, 38(23): 5046～5057

[3] R. J. Blaikie, S. J. McNab. Evanescent interferometric lithography［J］. Appl. Opt., 2001, 40(10): 1692～1698

[4] W. Srituravanich, N. Fang, C. Sun et al.. Plasmonic nanolithography［J］. Nano. Lett., 2004, 4(6): 1085～1088

[5] D. B. Shao, S. C. Chen. Numerical simulation of surface-plasmon assisted nanolithography［J］. Opt. Express, 2005, 13(18): 6964～6973

[6] X. W. Guo, J. L. Du, Y. K. Guo et al.. Large-area surface plasmon polariton interference lithography［J］. Opt. Lett., 2006, 31(17): 2613～2615

[7] J. Q. Wang, H. M. Liang, X. Y. Niu et al.. Enhancing exposure depth for surface-plasmon polaritons interference nanolithography by waveguide modulation［J］. J. Appl. Phys., 2010, 108(1): 014308

[8] X. Y. Niu, Y. M. Qi, J. Q. Wang et al.. Approach of enhancing exposure depth for evanescent wave interference lithography［J］. Microelectron. Engng., 2010, 87(5-8): 1168～1171

[9] X. W. Guo, J. L. Du, X. G. Luo et al.. Surface-plasmon polariton interference nanolithography based on end-fire coupling［J］. Microelectron. Engng., 2007, 84(5-8): 1037～1040

[10] F. Liang, J. L. Du, X. W. Guo et al.. The theoretic analysis of maskless surface plasmon resonant interference lithography by prism coupling［J］. Chin. Phys. B, 2008, 17(7): 2499～2503

[11] Jin Fengze, Fang Liang, Zhang Zhiyou et al.. Photonic crystal fabrication based on surface plasmon polaritons interference nanolitongraphy［J］. Acta Optica Sinica, 2009, 29(4): 1075～1078

[12] Zhao Chengqiang, Xu Wendong, Hong Xiaogang et al.. Probe inducing surface plasmon resonance nanolithographic system［J］. Acta Optica Sinica, 2009, 29(2): 473～477

[13] Hong Xiaogang, Xu Wengdong, Li Xiaogang et al.. Numerical simulation of probe induced surface plasmon resonance coupling nanolithography［J］. Acta Physica Sinica, 2008, 57(10): 6643～6648

[14] M. Y. He, Z. Y. Zhang, S. Shi et al.. A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique［J］. Opt. Express, 2010, 18(15): 15975～15980

[15] I. Pockrand. Surface plasma oscillations at silver surfaces with thin transparent and absorbing coatings［J］. Surf. Sci., 1978, 72(3): 577～588