| Traditionalsintering | Conventional sintering (ConvS) | Thermal sintering at heating rate of 1-10 ℃/min |
| Two step sintering (TSS) | Thermal sintering divided in two steps (heating; cooling and densification) |
| Fast firing (FF) | Rapid sintering with short soaking times and high heating rates |
| Sinter forging (SF) | Sintering in presence of uniaxial pressure in die-less configuration |
| Hot pressing (HP) | Sintering at high temperature and in presence of uniaxial pressure |
| Hydrothermal hot pressing (HIP) | Sintering at high temperature and in presence of hydrostatic pressure |
| Liquid phase sintering | Cold sintering process (CSP) | Sintering at T<400 ℃ in presence of solvent and uniaxial pressure |
| Cold hydrostatic consolidation (CHC) | Sintering at room temperature in presence of solvent and hydrostatic pressure |
| Hydrothermal hot pressing (HHP) | Pressure-assisted sintering in hydrothermal conditions |
| Hydrothermal reaction sintering (HRS) | Sintering of oxide ceramics in presence of supercritical water |
| Water vapor-assisted sintering (WVAS) | Conventional sintering in a humid atmosphere |
| Reactive hydrothermal liquid-phase densification (rHLPD) | Sintering at low temperature assisted by hydrothermal reaction |
| Flash-like | Flash sintering (FS) | Rapid sintering at low furnace temperature in presence of electric field |
| Thermally insulated flash sintering (TIFS) | Flash sintering where the sample is thermally insulated from the environment |
| Flash sinterforging (FSF) | Flash sintering in presence of uniaxial pressure in die-less configuration |
| Sliding electrodes flash sintering (SEFS) | Flash sintering where the electrodes are in relative motion with respect to the sample |
| Water-assisted flash sintering (WAFS) | Flash sintering in humid atmosphere |
| Contactless flash sintering (CLFS) | Flash sintering with electrodes in non-contact mode |
| SPS-like | Spark plasma sintering (SPS) | Sintering in presence of a DC electric potential and uniaxial pressure |
| Deformable punch spark plasma sintering (DPSPS) | Spark plasma sintering at very high pressure (1000-2000 MPa) |
| Flash spark plasma sintering (FSPS) | Hybrid technique of flash sintering and spark plasma sintering |
| Cool spark plasma sintering (CSPS) | Spark plasma sintering at T<400 ℃ and high pressure (300-600 MPa) |
| High pressure spark plasma sintering (HPSPS) | Spark plasma sintering at high pressure (102-103 MPa) |
| Sacrificial material spark plasma sintering (SMPS) | Spark plasma sintering with a sacrificial die to form samples with complex shapes |
| Others | Ultrafast high-temperature sintering (UHS) | Rapid sintering at heating rate of 103-104 ℃/min |
| Cold sintering (CS) | Sintering of ductile materials at high pressure and low temperature |
| Microwave sintering (MWS) | Densification assisted by heating with an electromagnetic radiation |
| Induction sintering (IS) | Densification assisted by heating with an induction system |
| Capacitor discharge sintering (CDS) | Rapid sintering with electric energy supplied by capacitor discharge |
![Quaternary diagram of sintering techniques[13]](/richHtml/jim/2023/38/2/125/img_1.png)
![Schematic diagram of densification mechanism of CSP[20,38]](/richHtml/jim/2023/38/2/125/img_2.png)
![SEM images of Li2MoO4 before and after cold sintering[20]](/Images/icon/loading.gif){kind=icon}
