• Laser & Optoelectronics Progress
  • Vol. 52, Issue 10, 101101 (2015)
Jiang Haibo1、2、* and Xing Tingwen1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less
    DOI: 10.3788/lop52.101101 Cite this Article Set citation alerts
    Jiang Haibo, Xing Tingwen. A Method of Source Optimization to Maximize Process Window[J]. Laser & Optoelectronics Progress, 2015, 52(10): 101101 Copy Citation Text show less
    References

    [1] Hu Zhonghua, Yang Baoxi, Zhu Jing, et al.. Design of diffractive optical element for pupil shaping optics in projection lithography system[J]. Chinese J Lasers, 2013, 40(6): 0616001.

    [2] Song Qiang, Zhu Jing, Wang Jian, et al.. A mixed gradient algorithm for high performance DOE design in off-axis lithography illumination system[J]. Acta Optica Sinica, 2015, 35(1): 0122005.

    [3] M Mulder, A Engelen, O Noordman, et al.. Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems[C]. SPIE, 2009, 7520: 75200Y.

    [4] S Inoue, T Fujisawa, S Tamaushi, et al.. Optimization of partially coherent optical system for optical lithography[J]. J Vac Sci Technol, 1992, 10(6): 3004-3007.

    [5] R R Vallishayee, S A Orszag, E Barouch. Optimization of stepper parameters and their influence on OPC[C]. SPIE, 1996, 2726: 660-669.

    [6] T E Brist, G E Bailey. Effective multicutline QUASAR illumination optimization for SRAM and logic[C]. SPIE, 2003, 5042: 153-159.

    [7] Y Granik. Source optimization for image fidelity and throughput[C]. SPIE, 2004, 3(4): 509-522.

    [8] M Burkhardt, A Yen, C Progler, et al.. Illuminator design for printing of regular contact patterns[J]. Microelectron Eng, 1998, 41-42: 91-95.

    [9] C C Hsia, T S Gau, C H Yang, et al.. Customized off-axis illumination aperture filtering for sub-0.18 KrF lithography[C]. SPIE, 1999, 3679: 427-434.

    [10] A E Rosenbluth, S Bukofsky, C Fonseca, et al.. Optimum mask and source patterns to print a given shape[C]. SPIE, 2002, 1(1): 13-30.

    [11] E Barouch, S L Knodle, S A Orszag, et al.. Illuminator optimization for projection printing[C]. SPIE, 1999, 3679: 697-703.

    [12] Li Zhaoze, Li Sikun, Wang Xiangzhao. Source and mask optimization using stochastic parallel gradient descent algorithm in optical lithography[J]. Acta Optica Sinica, 2014, 34(9): 0911002.

    [13] Yan Guanyong, Li Sikun, Wang Xiangzhao. Source optimization method of lithography tools based on quadratic programming [J]. Acta Optica Sinica, 2014, 34(10): 1022004.

    [14] Wang Lei, Li Sikun, Wang Xiangzhao, et al.. Source optimization using particle swarm optimization algorithm in optical lithography[J]. Acta Optica Sinica, 2015, 35(4): 0422002.

    [15] A Erdmann, T Fühner, T Schnattinger, et al.. Toward automatic mask and source optimization for optical lithography[C]. SPIE, 2004, 5377: 646-657.

    Jiang Haibo, Xing Tingwen. A Method of Source Optimization to Maximize Process Window[J]. Laser & Optoelectronics Progress, 2015, 52(10): 101101
    Download Citation