• Journal of Infrared and Millimeter Waves
  • Vol. 36, Issue 6, 756 (2017)
HUO Shu-Chun1、2、*, HU Chun-Guang1, SHEN Wan-Fu1, LI Yan-Ning1, and HU Xiao-Tang1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.11972/j.issn.1001-9014.2017.06.020 Cite this Article
    HUO Shu-Chun, HU Chun-Guang, SHEN Wan-Fu, LI Yan-Ning, HU Xiao-Tang. Spatial uniformity of organic thin films based on reflectance difference microscopy[J]. Journal of Infrared and Millimeter Waves, 2017, 36(6): 756 Copy Citation Text show less

    Abstract

    Organic thin-film semiconductor devices have important applications in the fields of microelectronics and optoelectronics. The film quality is one of the key factors affecting the device performance such as the uniformity of film spatial distribution. This parameter was studied by analyzing the reflectance difference maps of pentacene thin film grown on an anisotropic substrate which were measured by reflectance difference microscopy.
    HUO Shu-Chun, HU Chun-Guang, SHEN Wan-Fu, LI Yan-Ning, HU Xiao-Tang. Spatial uniformity of organic thin films based on reflectance difference microscopy[J]. Journal of Infrared and Millimeter Waves, 2017, 36(6): 756
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