Spectrum Diagnostics for the Time of Pre-Sputtering in Thin Films Deposited by Magnetron Puttering

GUO Qing-lin; FAN Qing; CUI Yong-liang; DONG Kai-hu; ZHANG Lei; LI Xu; ZHANG Jin-ping; CHEN Jin-zhong

doi:10.3964/j.issn.1000-0593(2013)03-0595-05

Journals >Spectroscopy and Spectral Analysis >Volume 33 >Issue 3 >Page 595 > Article

Spectroscopy and Spectral Analysis
Vol. 33, Issue 3, 595 (2013)

Spectrum Diagnostics for the Time of Pre-Sputtering in Thin Films Deposited by Magnetron Puttering

GUO Qing-lin^*, FAN Qing, CUI Yong-liang, DONG Kai-hu, ZHANG Lei, LI Xu, ZHANG Jin-ping, and CHEN Jin-zhong

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[in Chinese]

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DOI: 10.3964/j.issn.1000-0593(2013)03-0595-05 Cite this Article

GUO Qing-lin, FAN Qing, CUI Yong-liang, DONG Kai-hu, ZHANG Lei, LI Xu, ZHANG Jin-ping, CHEN Jin-zhong. Spectrum Diagnostics for the Time of Pre-Sputtering in Thin Films Deposited by Magnetron Puttering[J]. Spectroscopy and Spectral Analysis, 2013, 33(3): 595 Copy Citation Text

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References

[1] HUANG Hanchen, Wei H L, Woo C H, et al. Applied Physics Letters, 2002, 81(23): 4359.

[2] Corbella C, Rubio-Roy M, Bertran E, et al. Journal of Applied Physics, 2009, 106(3): 033302.

[5] Jiang Hui, Zhu Jingtao, Huang Qiushi, et al. Applied Surface Science, 2011, 257(23): 9946.

[6] Kattareeya Taweesub, Patama Visuttipitukul, Sukkaneste Tungkasmita, et al. Surface and Coatings Technology, 2010, 204(18-19): 3091.

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