• Spectroscopy and Spectral Analysis
  • Vol. 35, Issue 11, 3007 (2015)
CAO Wei and MA Zhi-bin
Author Affiliations
  • [in Chinese]
  • show less
    DOI: 10.3964/j.issn.1000-0593(2015)11-3007-05 Cite this Article
    CAO Wei, MA Zhi-bin. Optical Spectroscopy for High-Pressure Microwave Plasma Chemical Vapor Deposition of Diamond Films[J]. Spectroscopy and Spectral Analysis, 2015, 35(11): 3007 Copy Citation Text show less
    References

    [1] Malshe A P, Park B S, Brown W D, et al. Diamond and Related Materials, 1999, 8(7): 1198.

    [2] Bert Willems, Alexandre Tallaire, Jocelyn Achard. Diamond and Related Materials, 2014, 41: 25.

    [3] Muchnikov A B, Vikharev A L, Gorbachev A M, et al. Diamond and Related Materials, 2010, 19: 432.

    [4] Ding Ming Q, Li Lili, Feng Jinjun. Applied Surface Science, 2012, 258: 5987.

    [6] Liang Xingbo, Wang Lei, Zhu Hongliang, et al. Surface and Coatings Technology, 2007, 202(2): 261.

    [7] Li Xianglin, James Perkins, Ramon Collazo, et al. Diamond and Related Materials, 2006, 15(11-12): 1784.

    [9] Han Young-Soo, Kim Yoon-Kee, Lee Jai-Young. Thin Solid Film, 1997, 310: 39.

    [10] Chen Chia-Fu, Huang Yen C, Satoru Hosomi, et al. Materials Research Bulletin, 1989, 24(1):87.

    [12] Elliott M A, May P W, Petherbridge J, et al. Diamond and Related Materials, 2000, 9: 311.

    [13] Sternschulte H, Bauer T, Schreck M, et al. Diamond and Related Materials, 2006, 15: 542.

    [14] Wang Chuansheng, Chen Huangchin, Shih Wenching, et al. Diamond and Related Material, 2010, 19: 138.

    [15] Hassan Chatel, Jamal Bougdira, Michel Remy, et al. Diamond and Related Material, 1997, 6: 107.

    CAO Wei, MA Zhi-bin. Optical Spectroscopy for High-Pressure Microwave Plasma Chemical Vapor Deposition of Diamond Films[J]. Spectroscopy and Spectral Analysis, 2015, 35(11): 3007
    Download Citation