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Journals >Opto-Electronic Engineering >Volume 31 >Issue 11 >Page 66 > Article

Opto-Electronic Engineering
Vol. 31, Issue 11, 66 (2004)

The influence of stress on transmission property of narrow-band filter with multilayer thin film

[in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]

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[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. The influence of stress on transmission property of narrow-band filter with multilayer thin film[J]. Opto-Electronic Engineering, 2004, 31(11): 66 Copy Citation Text

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References

[1] BAUMEISTER Philip. Bandpass filters for wavelength division multiplexing-modification of the spectral bandwidth[J]. Appl. Opt, 1998, 37(28): 6609-6614.

[2] VERLY P G. Accurate design of square bandpass interference filters[J]. SPIE, 1999, 3738: 262-267.

[3] MARTIN P J, Macleod H A, Netterfield R P, et al. Ion beam assisted deposition of thin film [J]. Appl. Opt, 1983,22(1):178-184.

[4] DEMIRYONT H, JAMES S R, KENT G. Effect of oxygen content on the properties of tantalum oxide films deposited by ion beam sputtering[J]. Appl. Opt, 1985, 24(10): 490-495.

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[3] YU Kan, BAO Jia-qi1, HUANG De-xiu, WU Chang-fa. Restraining Technology on the Polarization Dependent Loss of the Thin-film Filter in Oblique Incidence[J]. Opto-Electronic Engineering, 2010, 37(1): 101

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. The influence of stress on transmission property of narrow-band filter with multilayer thin film[J]. Opto-Electronic Engineering, 2004, 31(11): 66

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