Measurement and Evaluation for the Optical System in Laser Large-Area Scanning Projection Imaging Lithography

Mei Longhua; Zhou Jinyun; Lei Liang; Lin Qinghua; Wang Xinxing; Shi Ying

doi:10.3788/lop49.072201

[1] M. Hakaru. Progress of excimer laser technologied ［C］. SPIE, 2000, 4226: 16～26

[2] K. Jain, M. Zemel, M. Klosner. Large-area high-resolution lithography and photoablation systems for microelectronics and optoelectronics fabrication ［J］. IEEE, 2002, 90(10): 1681～1688

[3] Jinyun Zhou, Qin Ouyang, Qinghua Lin et al.. 351 nm Excimer large-area lithography by scanning and projection ［J］. Advanced Materials Research, 2010, 139～141:758～761

[4] Li Hongxia, Lou Qihong, Ye Zhenhuan et al.. Research on evaluating norm of excimer laser beam uniformity ［J］. Chinese J. Lasers, 2004, 16(6): 729～732

[5] Lin Qinghua, Song Chao, Wang Lubin et al.. Beam shaping of excimer laser used for lithography and its research progress ［J］. Chinese J. Quantum Electronics, 2007, 24(4): 415～419

[6] Li Wenjing, Zhou Jinyun, Lin Qinghua. Design of fold laser projection lithography lens ［J］. Opto-Electronic Engineering, 2007, 34(9): 46～49

[7] G. Klauminzer, C. Abele. Excimer lasers need specification for beam uniformity ［J］. Laser Focus World, 1991, 27(5): 153～158

[8] Wang Xinxing, Zhou Jinyun, Lei Liang et al.. High resolution ITO lithography using excimer laser for flat-panel display fabrication ［J］. Advanced Materials Research, 2011, 314～316:1910～1913

CLP Journals