• Acta Optica Sinica
  • Vol. 16, Issue 10, 1379 (1996)
[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
Author Affiliations
  • [in Chinese]
  • show less
    DOI: Cite this Article Set citation alerts
    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Beam Homogenizer for XeCl Excimer Laser and Its Applications[J]. Acta Optica Sinica, 1996, 16(10): 1379 Copy Citation Text show less

    Abstract

    A beam homogenizer was used to improve the intensity distribution of the output beam from XeCl excimer laser. The results demonstrated that the irradiation uniformity was better than 2%. Using this apparatus, the etch threshold of solid thin film was measured and excimer laser induced electrical conductivity in C 60 thin film has been studied experimentally.
    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Beam Homogenizer for XeCl Excimer Laser and Its Applications[J]. Acta Optica Sinica, 1996, 16(10): 1379
    Download Citation