Mechanism, Characterization, and Device Application of Photothermoelectric Effect

Zhiqiang Guan; Wei Dai; Xiuping Chen; Hongxing Xu

doi:10.3788/CJL221306

Journals >Chinese Journal of Lasers >Volume 50 >Issue 1 >Page 0113004 > Article

Chinese Journal of Lasers
Vol. 50, Issue 1, 0113004 (2023)

Mechanism, Characterization, and Device Application of Photothermoelectric Effect

Zhiqiang Guan^{1、2、3、4、*}, Wei Dai², Xiuping Chen², and Hongxing Xu^2、3、4

Author Affiliations

¹Hubei Yangtze Memory Laboratories, Wuhan 430205, Hubei , China

²School of Physics and Technology, Wuhan University, Wuhan 430072, Hubei , China

³School of Microelectronics, Wuhan University, Wuhan 430072, Hubei , China

⁴Center for Nanoscience and Nanotechnology, and Key Laboratory of Artificial Micro- and Nano-Structures of Ministry of Education, Wuhan University, Wuhan 430072, Hubei , China

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DOI: 10.3788/CJL221306 Cite this Article Set citation alerts

Zhiqiang Guan, Wei Dai, Xiuping Chen, Hongxing Xu. Mechanism, Characterization, and Device Application of Photothermoelectric Effect[J]. Chinese Journal of Lasers, 2023, 50(1): 0113004 Copy Citation Text

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Zhiqiang Guan, Wei Dai, Xiuping Chen, Hongxing Xu. Mechanism, Characterization, and Device Application of Photothermoelectric Effect[J]. Chinese Journal of Lasers, 2023, 50(1): 0113004

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