• Acta Photonica Sinica
  • Vol. 51, Issue 6, 0631002 (2022)
Yamei LIU, Haihang MA, Yan GU*, Zhou HUANG, and Shun ZHANG
Author Affiliations
  • College of Mechanical Engineering,Changchun University of Technology,Changchun 130012,China
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    DOI: 10.3788/gzxb20225106.0631002 Cite this Article
    Yamei LIU, Haihang MA, Yan GU, Zhou HUANG, Shun ZHANG. Preparation of Double-sided Grating Structure Film by Vibration-assisted Nanoimprinting Lithography[J]. Acta Photonica Sinica, 2022, 51(6): 0631002 Copy Citation Text show less

    Abstract

    To solve the problems of the low filling rate of the photoresist leads to poor pattern transfer quality, and excessive imprinting force damages the surface morphology of the template in the nanoimprinting process. A low-frequency and low-amplitude vibration-assisted nanoimprinting method based on piezoelectric driving is proposed. This method is used to prepare grating structures. Applying lateral one-dimensional vibration reduces the imprinting force required for nanoimprinting and improves the filling rate of the photoresist to the template cavity in nanoimprinting process.To study the influence of the periodic change of the double-sided grating film on the transmittance, the Finite Difference Time Domain (FDTD) method is used to simulate and analyze the double-sided grating structure with different period parameters in the wavelength range of 500~1 500 nm. The influence law of period parameter on transmittance is obtained. When all the dimension parameters of the grating structure are constant, the smaller the upper surface grating period, the larger the lower surface grating period, and the higher the average transmittance. The double-sided grating structure is selected to prepare the upper surface grating period of 800 nm, and the lower surface grating period of 1 800 nm. Study the mechanism of vibration effect on photoresist filling by establishing a mathematical model of vibration-assisted nanoimprint. The variation law of the filling rate with the vibration parameters after the vibration is introduced by the simulation simulation. Simulation results show that the vibration frequency has almost no effect on the filling rate when the vibration amplitude is constant. As the vibration amplitude increases, the filling rate first increases and then decreases. Through simulation analysis, the frequency of 100 Hz and the amplitude of 300 nm are selected as the vibration parameters of the upper surface grating. The frequency of 100 Hz and the amplitude of 600 nm are selected as the vibration parameters of the lower surface grating. The vibration-assisted nanoimprinting experiment is carried out on the developed vibration device. Characterize the surface topography of the double-sided grating structure, and perform the transmittance test. Experimental results show that compared with vibration-free nanoimprinting lithography technology, the filling rate of photoresist is significantly improved. It also improves the quality of pattern transfer and reduces large-area surface defects. The height of the grating prepared by applying vibration is basically the same as the height of the template cavity. It is confirmed that the filling rate of the photoresist is significantly improved after vibration applying, and the surface topography of the grating is improved. By the transmittance detection, compared with SiO2 without film, the average transmittance of SiO2 with double-sided grating film prepared by vibration-assisted nanoimprinting is increased by 6% in the wavelength range of 500~1 500 nm.