• Chinese Optics Letters
  • Vol. 10, Issue 12, 121202 (2012)
Dongbo Xu, Xiangzhao Wang, Yang Bu, Lifeng Duan, Guanyong Yan, Jishuo Yang, and Anatoly Y.
DOI: 10.3788/col201210.121202 Cite this Article Set citation alerts
Dongbo Xu, Xiangzhao Wang, Yang Bu, Lifeng Duan, Guanyong Yan, Jishuo Yang, Anatoly Y.. In situ aberration measurement technique based on multi-illumination settings and principal component analysis of aerial images[J]. Chinese Optics Letters, 2012, 10(12): 121202 Copy Citation Text show less
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CLP Journals

[1] Boer Zhu, Sikun Li, Xiangzhao Wang, Fengzhao Dai, Feng Tang, Lifeng Duan. High-Order Aberration Measurement Technique for Immersion Lithography Projection Lens Based on Multi-Polarized illuminations[J]. Acta Optica Sinica, 2018, 38(7): 0712004

Data from CrossRef

[1] Guanyong Yan, Xiangzhao Wang, Sikun Li, Jishuo Yang, Dongbo Xu. Aberration measurement based on principal component analysis of aerial images of optimized marks. Optics Communications, 329, 63(2014).

[2] Boer Zhu, Xiangzhao Wang, Sikun Li, Guanyong Yan, Lina Shen, Lifeng Duan. Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image. Applied Optics, 55, 3192(2016).

[3] Guanyong Yan, Xiangzhao Wang, Sikun Li, Jishuo Yang, Dongbo Xu, Andreas Erdmann. Aberration measurement technique based on an analytical linear model of a through-focus aerial image. Optics Express, 22, 5623(2014).

Dongbo Xu, Xiangzhao Wang, Yang Bu, Lifeng Duan, Guanyong Yan, Jishuo Yang, Anatoly Y.. In situ aberration measurement technique based on multi-illumination settings and principal component analysis of aerial images[J]. Chinese Optics Letters, 2012, 10(12): 121202
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