• Acta Optica Sinica
  • Vol. 31, Issue 12, 1213001 (2011)
Le Zichun1、*, Li Rui1, Hu Jinhua1, and Dong Wen2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/aos201131.1213001 Cite this Article Set citation alerts
    Le Zichun, Li Rui, Hu Jinhua, Dong Wen. Vertical Nano-Microring Resonators with Enhanced Tolerance to Fabrication Misalignments[J]. Acta Optica Sinica, 2011, 31(12): 1213001 Copy Citation Text show less

    Abstract

    Microring resonators are key components in nowadays photonic integrated circuits. A vertical microring resonator with enhanced tolerance to fabrication misalignments is introduced. Both straight and microring waveguides are with relatively high refractive-index difference between the core and cladding, therefore the vertical microring resonator is compact and confines the power efficiently. Based on coupling mode theory, the coupling coefficient is derived as a function of the coupling layer thickness (d) and the transverse offset (Δ) between the straight and microring waveguides. The analytic solutions are used to confine the range of three-dimensional finite-different time-domain (3D-FDTD) simulations for their efficiency. In addition, the tolerance of d and Δ is studied by taking consideration of actual fabrication technology for the vertical nano-microring resonator. The analytic solutions and simulation results show that when d=30 nm, the vertical microring resonator has a large coupling coefficient even Δ is varied from 130 to 265 nm. It is verified that the vertical nano-microring resonator has enhanced tolerance to fabrication misalignments.
    Le Zichun, Li Rui, Hu Jinhua, Dong Wen. Vertical Nano-Microring Resonators with Enhanced Tolerance to Fabrication Misalignments[J]. Acta Optica Sinica, 2011, 31(12): 1213001
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