Abstract
Introduction
Infrared imaging systems are widely used in the national defense, science, medical and industrial fields [
The pixel circuit in the readout circuit is directly connected to the photodiode to integrate the photocurrent. Two modes are typically used to readout the pixel signal: charge readout mode [
This paper proposes a new voltage readout structure to solve the problems mentioned above. The signal is transferred from pixel to column by double column buses instead of single column bus, reducing the non-uniformity and the nonlinearity caused by the parasitic resistor of the column bus. The source follower within four adjacent pixels in the same column is shared to increase the area and the aspect ratio. Therefore the non-uniformity and noise are reduced.
The content of this paper is as follows. Section 1 will introduce the new structure and operating principle of the proposed readout circuit, focusing on the analysis of double column buses readout mode and the four-pixel-shared source follower. And simulation results are presented as well. Section 2 will present the test results and imaging experiment. The conclusion will be given in Section 3.
1 The structure and principle of the readout circuit
1.1 Conventional readout circuit structure
The conventional 640×512 readout circuit architecture with voltage readout mode is shown in
Figure 1.Block diagram of the 640×512 conventional voltage readout mode readout circuit.
The circuit of conventional voltage readout mode [
Figure 2.Circuit diagram of the conventional voltage readout mode readout circuit.
It can be seen in
The term of i×RU is increasing as the scale of the array increases and the entire array will show a greater spatial non-uniformity.
In the readout circuits [
1.2 The proposed readout circuit structure
To solve the above problems, a readout structure with pixel-shared source follower and double column buses transmission is proposed as shown in
Figure 3.Block diagram of the pixel-level shared-SF and double column buses readout circuit.
The pixel-column signal transmission is completed through two column buses, eliminating the non-uniformity caused by the parasitic resistor and the nonlinearity caused by the source follower. The four adjacent pixels in the same column share a source follower, increasing the W/L and area of the source follower. Thereby the thermal noise, flicker noise, and non-uniformity caused by process variations are reduced. The circuit diagram of the signal path is shown in
Figure 4.Circuit diagram of the pixel-level shared-SF and double column buses readout circuit.
The working principle is as follows. When RS<1> and RSW<1> is high, the voltage VS is transferred to the column circuit by the shared source follower of the four adjacent pixel circuits. Thus, the area and the W/L of the source follower is four times of that of one single pixel. When the switches MSA and MSB are turned on, the current through M1 flows into M3 through MSA and the column bus BUSA. Similarly, the current through M2 flows into M4. Hence there is no current flowing through MSB and the column bus BUSB and no additional voltage drop over the parasitic resistor of this signal path. The source voltages of M1 and M2 are equal. The output voltage is:
The proposed structure and the conventional structure are compared by simulation. The nonlinearity and non-uniformity caused by the parasitic resistors of column bus and MOS switch are simulated and the results are shown in
Figure 5.Simulation results of the output deviation of the conventional and the proposed structure
Shared source follower of four adjacent rows firstly reduces the local non-uniformity within four rows. It also increases the area of the source follower by four times and the macroscopic non-uniformity of the entire array can be reduced. Monte-Carlo simulations are performed to compare the non-uniformity of the conventional structure and the proposed structure. The simulation result is shown in
Figure 6.Monte-Carlo simulation results of the conventional and the proposed structure
The simulation results of
Structure | Nonlinearity (Parasitic Resistor) | Non-uniformity (Parasitic Resistor) | Non-uniformity (Process Fluctuation) |
---|---|---|---|
conventional structure | 2.78% | 2.5% | 1.67% |
proposed structure | 0.27% | <0.1% | <0.6% |
Table 1. Comparison of the nonlinearity and non-uniformity between the conventional and the proposed structure
The pixel- shared source follower can reduce the noise as well as reduce the non-uniformity of the array. As shown in
f1 is the upper limit of the noise integration bandwidth, f0 is the lower limit of the flicker noise integration. As shown above, the noise includes thermal noise and flicker noise. Since the readout circuit operates at the temperature of liquid nitrogen, the thermal noise is relatively small compared to the flicker noise. To reduce the flicker noise, it's necessary to increase the area of the M1 and M2. The source followers M1 and M2 are limited by the pixel area and the matching relationship respectively, so the flicker noise cannot be effectively reduced.
The proposed pixel circuit uses a shared source follower of four adjacent pixels in the same column, and the source follower’s area is increased by four times compared with the conventional structure. In this case, the equivalent input noise is:
Since the frequency range of noise integration can be adjusted by the loading capacitance, f1 and f1' can be equal. The ratio of to is k. If the source follower MOSFETs of both structures work in the saturation region, k is approximately 2. If the source followers work in the sub-threshold region, k is slightly less than 2.
The ratio of the equivalent input noise of the two structures is as follows:
It can be seen that when source-followers in n pixels are shared, the area increases by n times, the flicker noise reduces to 1/ the thermal noise reduces significantly because of the increase of gm.
2 Experimental results
Based on the proposed structure of shared source follower and double column buses, a readout circuit for medium-wave infrared imaging system is designed and fabricated using a 0.35μm 2P3M CMOS process. The array size is 640×512 and the pixel pitch is 15μm. The supply voltage is 3.3V.
Figure 7.Photograph of the 640×512 readout circuit chip.
The readout circuit has two operation modes: integration while read (IWR) mode and integration then read (ITR) mode.
Figure 8.Test results of the readout circuit in IWR mode: (a) noise, (b) nonlinearity
The readout circuit is interconnected with mercury cadmium telluride (MCT) detector array by indium bumps, and the detector assembly is tested at the temperature of liquid nitrogen. The NETD is 18 mK and the non-uniformity is less than 5%. An infrared image captured by this assembly is shown in
Figure 9.Imaging result of the infrared imaging system.
The performance parameters of the readout circuit and imaging system are compared with other literatures in
Parameters | [23] | [11] | [20] | This work |
---|---|---|---|---|
Pixel size | 15 μm×15 μm | 15 μm×15 μm | 7.5 μm×7.5 μm | 15 μm×15 μm |
Array size | 640×512 | 640×512 | 640×512 | 640×512 |
Process | N/A | 0.35μm CMOS | 0.18μm CMOS | 0.35μm CMOS |
Power | 50 mW | 60 mW | N/A | 30 mW |
Charge handling capacity | 5.0 Me- | 6.6 Me- | 3.1 Me- | 7.0 Me- |
NETD | 25 mK | 20 mK | 25.5 mK | 18 mK |
Frame frequency | 100 Hz | 100 Hz | 100 Hz | 120 Hz |
Table 2. Comparison of the performance parameters of readout circuits
3 Conclusion
This paper presented a new readout structure for infrared focal plane array. The voltage signal is transferred from pixel to column by double column buses instead of a single column bus. The non-uniformity and the nonlinearity caused by parasitic resistor of column bus are eliminated. The source follower MOSFET is shared within four adjacent pixels. The transconductance and area of the source follower are increased and the thermal noise, flicker noise, and non-uniformity caused by the source follower mismatch are suppressed. A readout circuit using this structure is designed and fabricated in 0.35μm 2P3M CMOS process. It is assembled with mercury cadmium telluride (MCT) detector array and high-quality infrared images are obtained.
References
[1] A Rogalski. Infrared detectors: status and trends. Progress in quantum electronics, 27, 59-210(2003).
[2] F F Sizov. IR region challenges: Photon or thermal detectors? Outlook and means. Semiconductor physics quantum electronics & optoelectronics, 15, 183-199(2012).
[3] B Piji, Z Jun, H Fuzhong. Review of digital mid wave infrared focal plane array detector assembly. Infrared and Laser Engineering, 46, 0102003(2017).
[4] Shu-Cheng DONG, Jian WANG, Qi-Jie TANG. Design of a multiband near-infrared sky brightness monitor using an InSb detector. Review of Scientific Instruments, 89, 023107(2018).
[5] M Kopytko, K Jóźwikowski, P Martyniuk. Status of HgCdTe barrier infrared detectors grown by MOCVD in Military University of Technology. Journal of Electronic Materials, 45, 4563-4573(2016).
[6] Li-Bin YAO. CMOS readout circuit design for infrared image sensors. International Society for Optics and Photonics, 7384, 73841B(2009).
[7] E Mottin, P Pantigny, R Boch. Improved architecture of IRFPA readout circuits, 3061, 117-126(1997).
[9] Jun-Ming LIU, Qiang GUO, Wei WANG. Response characteristic of InSb IRFPA under high reverse bias condition, 8193, 81932C(2011).
[10] P M Tribolet, P Chorier, A Manissadjian. High-performance infrared detectors at Sofradir, 4028, 438-456(2000).
[11] I I Lee. Silicon readout ICs for third-generation 2D IR focal-plane arrays operating over the wavelength range 8–12 μm. Russian Microelectronics, 37, 114-120(2008).
[12] Yu GUAN, Jin-Chun WANG, De-Jun MA. Optical and Optoelectronic Sensing and Imaging Technology. International Society for Optics and Photonics, 9674, 967434(2015).
[13] P M Tribolet, P Chorier, S Dugalleix. Lightweight, compact, and affordable MW TV-format IR detectors, 5406, 193-204(2004).
[14] P Ballet, F Noël, F Pottier. Dual-band infrared detectors made on high-quality HgCdTe epilayers grown by molecular beam epitaxy on CdZnTe or CdTe/Ge substrates. Journal of electronic materials, 33, 667-672(2004).
[15] J D Benson, A B Cornfeld, M Martinka. Ellipsometric Determination of CdZnTe preparation for HgCdTe MBE Growth(1996).
[16] J H Choi, S H Kim, C Y Kim. Development of mid-wave 320x256 infrared focal plane array in Korea, 6542, 65420H(2007).
[17] P Tribolet, G Destefanis. Third generation and multicolor IRFPA developments: a unique approach based on DEFIR, 5783, 350-365(2005).
[18] J Baylet, O Gravrand, E Laffosse. Study of the pixel-pitch reduction for HgCdTe infrared dual-band detectors. Journal of electronic materials, 33, 690-700(2004).
[19] V Guériaux, E Belhaire, V Besnard. Image quality for an IRFPA: a system integrator point of view. Testing XXX. International Society for Optics and Photonics, 11001, 110010D(2019).
[20] S Bisotto, J Abergel, B Dupont. 5 µm and 5µm pitch IRFPA developments in MWIR at CEA-LETI[C]. Infrared Technology and Applications XLV. International Society for Optics and Photonics,, 11002, 110021C(2019).
[22] B Fièque, A Lamoure, F Salvetti. Development of astronomy large focal plane array" ALFA" at Sofradir and CEA. Infrared Detectors for Astronomy VIII. International Society for Optics and Photonics, 10709, 1070905(2018).
[23] A Bouakka-Manesse, N Jamin, A Delannoy. Space activity and programs at SOFRADIR, 9981, 998109(2016).
[24] Zhao-Feng HUANG, Yu-Ze NIU, Wen-Gao LU. Low-power, high-speed output buffer with shared-TIA for ultra-large IRFPAs. Electronics Letters, 55, 176-178(2019).
Set citation alerts for the article
Please enter your email address