[1] Eliasson B, Kogelschatz U. IEEE Trans. Plasma Science, 1991, 19(2): 309.
[3] Kogelschatz U. Plasma Chemistry and Plasma Processing, 2003, 23(1): 1.
[4] Kogelschatz U. IEEE Trans. Plasma Sci., 2002, 30(4): 1400.
[5] Stefanovic I, Bibinov N K, Deryugin A A, et al. Plasma Sources Sci. Technol., 2001, 10(3): 406.
[6] Mildren R P, Carman R J. J. Phys. D: Appl. Phys., 2001, 34(1): L1.
[7] Shirai H, Kobayashi T, Hasegawa Y. Appl. Phys. Lett., 2005, 87: 143112.
[8] Kuzumoto M, Ogawa S J, Tanaka M, et al. IEEE Journal of Quantum Electronics, 1990, 26(6): 1130.
[9] Kim J, Byun D J, Kim J S, et al. Journal of Crystal Growth, 2000, 210: 478.
[10] Koichi T, Tamiya F. IEEE Trans. on Plasma Sci., 2001, 29(3): 518.
[11] Uhm H S, CHoi E H, Lim Y. Appl. Phys. Letts., 2002, 80(5): 737.