Primary Study of Deep-Etch Synchrotron Radiation Lithography

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Acta Optica Sinica >Volume 14 >Issue 4 >Page 447 > Article

Acta Optica Sinica
Vol. 14, Issue 4, 447 (1994)

Primary Study of Deep-Etch Synchrotron Radiation Lithography

[in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]

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[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Primary Study of Deep-Etch Synchrotron Radiation Lithography[J]. Acta Optica Sinica, 1994, 14(4): 447 Copy Citation Text

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diameter is about 38～39 μm the height is about 25 μm.the length of foliag is 8 μm and windth 2.8 μm The LIGA technology is based on a combination of d

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Primary Study of Deep-Etch Synchrotron Radiation Lithography[J]. Acta Optica Sinica, 1994, 14(4): 447

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