One fast lithography simulation methodology is proposed for one-dimensional layout, taking advantage from the characteristics of partial coherent system and one-dimensional pattern. The new methodology consists of look-up table based on one-dimensional basis pattern, the minimum look-up table and its boundary extension, and simulation of large scale layout without division. Simulation and experiment results show that comparing the new algorithm with conventional method, the building time of look-up table is reduced by more than 95%, the simulation speed for basic pattern improves by about 48% and the simulation speed for large scale layout improves by more than 70% based on high accuracy.