Process Optimization of CCD UV-Responsive Sensitivity Enhancement by Spin-Coating

FENG Yu-xiang; MENG Yin-xia; ZHANG Guo-yu; WU Yi-hui; HAO Peng

doi:10.3964/j.issn.1000-0593(2017)09-2826-06

Journals >Spectroscopy and Spectral Analysis >Volume 37 >Issue 9 >Page 2826 > Article

Spectroscopy and Spectral Analysis
Vol. 37, Issue 9, 2826 (2017)

Process Optimization of CCD UV-Responsive Sensitivity Enhancement by Spin-Coating

FENG Yu-xiang^1、2、*, MENG Yin-xia², ZHANG Guo-yu², WU Yi-hui¹, and HAO Peng¹

Author Affiliations

¹[in Chinese]

²[in Chinese]

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DOI: 10.3964/j.issn.1000-0593(2017)09-2826-06 Cite this Article

FENG Yu-xiang, MENG Yin-xia, ZHANG Guo-yu, WU Yi-hui, HAO Peng. Process Optimization of CCD UV-Responsive Sensitivity Enhancement by Spin-Coating[J]. Spectroscopy and Spectral Analysis, 2017, 37(9): 2826 Copy Citation Text

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References

[4] Zheng Gong, Brandon K Chen, Jun Liu, et al. Light: Science & Applications, 2014, 10.1038/lsa.2014.105.

[5] Michael A Damento, Andrew A Barcellos, William V Schempp. SPIE, 2011, 2415: 204.

[6] Lin Chunche, Chen Weiting, et al. Light: Science & Applications, 2016, 10.1038/lsa.2016.66.

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