[1] Stefanovic I, Bibinov N K, Deryugin A A, et al. Plasma Sources Sci. Technol., 2001, 10(3): 406.
[2] Han S U, Eun H C, Lim Y. Appl. Phys. Letters, 2002, 80(5): 737.
[3] Gherarid N, Martin S, Massines F. J. Phys. D: Appl. Phys., 2000, 33(19): L104.
[4] Stefanovic I, Bibinov N K, Deryugin A A, et al. Plasma Sources Sci. Technol., 2001, 10(3): 406.
[5] Laroussi M, Alexeff I, Kang W L. IEEE Trams. Plasma Sci., 2000, 28(1): 184.
[6] Zhang H Y, Wang D Z, Wang X G. Chin. Phys., 2007, 16(4): 1089.
[7] Li X C, Zhao N, Fang T Z, et al. Plasma Sources Sci. Technol., 2008, 17: 015017.
[8] Ono R, Oda T. J. Appl. Phys., 2003, 93(10): 5876.
[9] Li S Z, Huang W T, Zhang J L, et al. Appl. Phys. Lett., 2009, 94: L1. 1501.