Multichannel high extinction ratio polarized beam splitters based on metasurfaces

Haoyu Wang; Jun Zheng; Yifei Fu; Chengliang Wang; Xinran Huang; Zhicheng Ye; Liejia Qian

doi:10.3788/COL201917.052303

Journals >Chinese Optics Letters >Volume 17 >Issue 5 >Page 052303 > Article

Chinese Optics Letters
Vol. 17, Issue 5, 052303 (2019)

Multichannel high extinction ratio polarized beam splitters based on metasurfaces

Haoyu Wang^1、2, Jun Zheng^1、2、*, Yifei Fu³, Chengliang Wang³, Xinran Huang^1、2, Zhicheng Ye³, and Liejia Qian^1、2、**

Author Affiliations

¹Key Laboratory for Laser Plasmas (MoE) and School of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai 200240, China

²Collaborative Innovation Center of IFSA (CICIFSA), Shanghai Jiao Tong University, Shanghai 200240, China

³Department of Electronic Engineering, Shanghai Jiao Tong University, Shanghai 200240, China

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DOI: 10.3788/COL201917.052303 Cite this Article Set citation alerts

Haoyu Wang, Jun Zheng, Yifei Fu, Chengliang Wang, Xinran Huang, Zhicheng Ye, Liejia Qian. Multichannel high extinction ratio polarized beam splitters based on metasurfaces[J]. Chinese Optics Letters, 2019, 17(5): 052303 Copy Citation Text

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$Schematic drawings of PBSs based on metasurfaces. Unpolarized light (red arrow) is incident on the structure with an angle of θi and divided into reflected TE (green arrow), −1st and −2nd diffracted TM lights (blue arrows) with diffraction angles of θ0, θ−1, and θ−2, respectively.$

Fig. 1. Schematic drawings of PBSs based on metasurfaces. Unpolarized light (red arrow) is incident on the structure with an angle of

θ_{i}

and divided into reflected TE (green arrow),

- 1^{st}

and

- 2^{nd}

diffracted TM lights (blue arrows) with diffraction angles of

θ_{0}

θ_{- 1}

, and

θ_{- 2}

, respectively.

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$Numerical simulation of the structure. a, The mode effective refractive index Neff changing with width s for MIM waveguide. The blue shading with s<sc indicates the region of only the TM mode. b, The reflected ETRTE/TM0 (dashed lines) and diffracted ETRTM/TE−1 (solid lines) changing with the nano-slit width. c, The splitting angle between the reflected and diffracted light beams. Left and right half figures indicate angles between −1st and −2nd diffracted TM and reflected TE lights, respectively. d, TM reflected spectra changing with h of nano-slits.$

Fig. 2. Numerical simulation of the structure. a, The mode effective refractive index

N_{eff}

changing with width

s

for MIM waveguide. The blue shading with

s < s_{c}

indicates the region of only the TM mode. b, The reflected

E T R_{TE / TM}^{0}

(dashed lines) and diffracted

E T R_{TM / TE}^{- 1}

(solid lines) changing with the nano-slit width. c, The splitting angle between the reflected and diffracted light beams. Left and right half figures indicate angles between

- 1^{st}

and

- 2^{nd}

diffracted TM and reflected TE lights, respectively. d, TM reflected spectra changing with

h

of nano-slits.

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$Simulated reflections and diffractions for one-slit and three-slit MNGs with a pitch of 800 nm under incident angle θi=40°. a, RTM0, RTE0, b, RTM−1, RTM−2, and, c, RTE−1, RTE−2 with one (dashed lines) or three slits (solid lines) in each period. The insets in b and c are the simulated electric field for TM and TE light, respectively, for the wavelength of 550 nm and θi=40°. The white dashed lines indicate the surface profile of the structure, and the white arrows depict the incident light. d, The simulated ETRTE/TM0 (red lines), ETRTM/TE−1 (green lines), and ETRTM/TE−2 (blue lines) of TE and TM light.$

Fig. 3. Simulated reflections and diffractions for one-slit and three-slit MNGs with a pitch of 800 nm under incident angle

θ_{i} = 40 °

. a,

R_{TM}^{0}

R_{TE}^{0}

, b,

R_{TM}^{- 1}

R_{TM}^{- 2}

, and, c,

R_{TE}^{- 1}

R_{TE}^{- 2}

with one (dashed lines) or three slits (solid lines) in each period. The insets in b and c are the simulated electric field for TM and TE light, respectively, for the wavelength of 550 nm and

θ_{i} = 40 °

. The white dashed lines indicate the surface profile of the structure, and the white arrows depict the incident light. d, The simulated

E T R_{TE / TM}^{0}

(red lines),

E T R_{TM / TE}^{- 1}

(green lines), and

E T R_{TM / TE}^{- 2}

(blue lines) of TE and TM light.

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Fig. 4. Simulated spectra of ETRs for one-slit and three-slit structures. a,

E T R_{TE / TM}^{0}

, b,

E T R_{TM / TE}^{- 1}

, c,

E T R_{TM / TE}^{- 2}

for the three-slit case and, d,

E T R_{TE / TM}^{0}

, e,

E T R_{TM / TE}^{- 1}

, f,

E T R_{TM / TE}^{- 2}

for the one-slit case with wavelengths of

400 - 800 nm

and incident angles of

0 ° - 70 °

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$SEM images and measured spectra dependent on incident angle for the 800 nm pitch structure. a, Top view and, b, side view of the fabricated sample. c, Measured reflected, cI, TE and, cII, TM spectra and, cIII, ETRTE/TM0 for wavelengths of 400–800 nm and incident angles of 5°–70°. d and e, Measured diffracted spectra, dI, RTE−1, dII, RTM−1, eI, RTE−2, eII, RTM−2 and, dIII, ETRTM/TE−1, eIII, ETRTM/TE−2 for wavelengths of 400–800 nm and incident angles of 20°–60°. As a note, due to the methods of measurement, the reflection spectrum cannot be measured when the angle between the incidence and reflection is less than 5°.$

Fig. 5. SEM images and measured spectra dependent on incident angle for the 800 nm pitch structure. a, Top view and, b, side view of the fabricated sample. c, Measured reflected, c_I, TE and, c_II, TM spectra and, c_III,

E T R_{TE / TM}^{0}

for wavelengths of

400 - 800 nm

and incident angles of

5 ° - 70 °

. d and e, Measured diffracted spectra, d_I,

R_{TE}^{- 1}

, d_II,

R_{TM}^{- 1}

, e_I,

R_{TE}^{- 2}

, e_II,

R_{TM}^{- 2}

and, d_III,

E T R_{TM / TE}^{- 1}

, e_III,

E T R_{TM / TE}^{- 2}

for wavelengths of 400–800 nm and incident angles of

20 ° - 60 °

. As a note, due to the methods of measurement, the reflection spectrum cannot be measured when the angle between the incidence and reflection is less than 5°.

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$SEM images and measured spectra dependent on incident angle for the 600 nm pitch structure. a, Top view and, b, side view of the fabricated sample. c, Measured reflected, cI, TE and, cII, TM spectra and, cIII, ETRTE/TM0 for different wavelengths and incident angles of 5°–70° in the visible band. d, Measured diffracted spectra, dI, RTE−1, dII, RTM−1, and, dIII, ETRTM/TE−1 for incident angles of 25°–70° in the visible band.$

Fig. 6. SEM images and measured spectra dependent on incident angle for the 600 nm pitch structure. a, Top view and, b, side view of the fabricated sample. c, Measured reflected, c_I, TE and, c_II, TM spectra and, c_III,