• Laser & Optoelectronics Progress
  • Vol. 52, Issue 6, 62201 (2015)
Chen Jinxin1、2、*, Wu Xiaobin1, and Wang Yu1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/lop52.062201 Cite this Article Set citation alerts
    Chen Jinxin, Wu Xiaobin, Wang Yu. Optical Simulation Research on Damage Testing System of Extreme Ultraviolet Radiation[J]. Laser & Optoelectronics Progress, 2015, 52(6): 62201 Copy Citation Text show less
    References

    [1] H Meiling, W de Boeij, F Bornebroek, et al.. From performance validation to volume introduction of ASML′s NXE platform[C]. SPIE, 2012, 8322: 83221G.

    [2] M Lowisch, P Kuerz, O Conradi, et al.. Optics for ASML′s NXE: 3300B platform[C]. SPIE, 2013, 8679: 86791H.

    [3] Cao Zhen, Li Yanqiu, Liu Fei. Manufacturable design of 16~22 nm extreme ultraviolet lithographic Objective[J]. Acta Optica Sinica, 2013, 33(9): 0922005.

    [4] Wang Xun, Jin Chunshui, Kuang Shangqi, et al.. Simulation model of surface carbon deposition contamination under extreme ultraviolet radiation[J]. Acta Optica Sinica, 2014, 34(5): 0531001.

    [5] Zuo Baojun, Zhu Dongyuan, Zhang Shuqing, et al.. Development of EUV source collectors for next generation lithography[J]. Laser & Infrared, 2010, 40(11): 1163-1167.

    [6] Wang Jun, Jin Chunshui, Wang Liping, et al.. Foundation and application of model for multilayers analysis in extreme ultra-violet lithography projection[J]. Acta Optica Sinica, 2014, 34(8): 0811002.

    [7] Liu Xiaolei, Li Sikun, Wang Xiangzhao. Simplified model for defective multilayer diffraction spectrum simulation in extreme ultraviolet lithography[J]. Acta Optica Sinica, 2014, 34(9): 0905002.

    Chen Jinxin, Wu Xiaobin, Wang Yu. Optical Simulation Research on Damage Testing System of Extreme Ultraviolet Radiation[J]. Laser & Optoelectronics Progress, 2015, 52(6): 62201
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