Effect of Material Inhomogeneity on the Image Quality of Optical Systems with Extremely Small Aberration

Yang Tianxing; Huang Wei; Shang Hongbo; Xu Weicai; Zhao Feifei

doi:10.3788/lop50.112202

[1] Xu Weicai. Optical Design and Imaging Performance Compensation for the Lithographic Lens[D]. Changchun: Changchun Institute of Optics, Fine Mechanics and Physics Chinese Academy of Sciences, 2011. 15-35.

[2] Julie L Ladison, Joseph F Ellison, Douglas C Allan, et al.. Achieving low wavefront specifications for DUV lithography: impact of residual stress in HPFS fused silica[C]. SPIE, 2001, 4346: 1416-1423.

[3] Richard N Pfisterer. Design of an objective for night vision application using axial GRIN materials[C]. SPIE, 1995, 2537: 270-278.

[4] Harry J Levinson. Principles of Lithography (Third Edition)[M]. Bellingham: SPIE Press, 2010. 16-20.

[5] Xu Weicai, Huang Wei, Yang Wang. Magnification tolerancing and compensation for the lithographic projection lens[J]. Acta Optica Sinica, 2011, 31(11): 1122003.

[6] Anurag Sharma, D Vizia Kumar, A K Ghatak. Tracing rays through graded-index media: a new method[J]. Appl Opt, 1982, 21(6): 984-987.

[7] G Hunter, L Sutton. Measurement of homogeneity of optical materials[C]. OSA, 1990 Technical Digest, 1990. 11.

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