• Laser & Optoelectronics Progress
  • Vol. 59, Issue 5, 0524001 (2022)
Guobin Sun, Jin Zhang*, Shilei Jiang, and Liu Yang
Author Affiliations
  • School of Optoelectronic Engineering, Xi'an Technological University, Xi'an , Shaanxi 710021, China
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    DOI: 10.3788/LOP202259.0524001 Cite this Article Set citation alerts
    Guobin Sun, Jin Zhang, Shilei Jiang, Liu Yang. Simulation of Ag Nano Pit-Silicon Grating Composite Microstructures Used for with Near Infrared Absorption Enhancement[J]. Laser & Optoelectronics Progress, 2022, 59(5): 0524001 Copy Citation Text show less

    Abstract

    Aiming at the characteristics of two-dimensional silicon grating microstructure in the near infrared light absorption rate is extremely low, a micro-nano composite structure is proposed to enhance the near infrared absorption of Ag nano-pit and silicon grating by using isolators. The absorption rate of the composite structure in the wavelength range from 0.78 μm to 2.5 μm is studied based on the finite-difference time-domain method. The influence of the grating structure and Ag nano-pits on the light absorption efficiency is analyzed. The simulation results show that when Ag nano pits with a diameter of 0.1 μm are embedded in the grating gap with a period of 0.2 μm and a duty cycle of 0.5 and on the surface of the grid column, the absorptivity of the composite microstructure is above 23% in the near infrared wide band, and the average absorptivity is up to 52.3%, theoretically. When Al2O3 dielectric layer is added on the grating surface, the absorption rate of wide band is above 41.3%, and the average absorption rate is increased to 65.1%. Finally, the absorption efficiency is improved in the wide wavelength range of near infrared, which provides a new method to enhance optical absorption in photodetector, solar cell, optical communication, radar stealth, biomedical and so on.
    Guobin Sun, Jin Zhang, Shilei Jiang, Liu Yang. Simulation of Ag Nano Pit-Silicon Grating Composite Microstructures Used for with Near Infrared Absorption Enhancement[J]. Laser & Optoelectronics Progress, 2022, 59(5): 0524001
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