According to the working principle of MEMS grating gyroscope, the gyroscope structure was simulated and manufactured at the wafer level. The structure model of the gyroscope was established in ANSYS. The analysis results showed that the driving mode and detection mode were 7 287 Hz and 7 288 Hz respectively, and the frequency difference was 1 Hz, which indicated that the structure had high sensitivity. The MEMS grating gyroscope was successfully manufactured by sputtering, wet etching, deep reactive ion etching, and anode bonding technology. The test system was built under atmospheric pressure. The measured driving mode and detection mode of the gyroscope were 7 675 Hz and 7 703 Hz respectively, and the relative error was 5.6% compared with the simulation results, which verified the feasibility of the process.