Deep Etch Binary Optics Element

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Acta Optica Sinica >Volume 16 >Issue 12 >Page 1796 > Article

Acta Optica Sinica
Vol. 16, Issue 12, 1796 (1996)

[in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]², [in Chinese]², and [in Chinese]²

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¹[in Chinese]

²[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Deep Etch Binary Optics Element[J]. Acta Optica Sinica, 1996, 16(12): 1796 Copy Citation Text

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Abstract

A novel deep etch binary optics element with phase depth exceeded 2π is developed. The relationship between deep etch binary element and diffrative efficiency is analysed theoretically and simulated by computer. The preliminary results about characteristics of the deep etch binary optics element are obtained.

Keywords

binary optics diffrative optics element deep etch

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Deep Etch Binary Optics Element[J]. Acta Optica Sinica, 1996, 16(12): 1796

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