Xinhui Ding, Hui Yu, Dawei Li, Junyong Zhang, Li Wang, Qiong Zhou, Xingqiang Lu, "Improved method to optimize the phase jump of multiple exposure-tiled gratings," High Power Laser Sci. Eng. 12, 06000e77 (2024)
- High Power Laser Science and Engineering
- Vol. 12, Issue 6, 06000e77 (2024)
Fig. 1. Layout of large-aperture tiled gratings in the SG-II compression chamber.
Fig. 2. Wavefront of the first SG-II grating in the compression chamber observed via an interferometer. (a) Orthogonal perspective and (b) oblique perspective.
Fig. 3. (a) Modulation on G2, G3 and G4 in the SG-II compressor chamber induced by tiled grating G1 with a 0.15λ phase jump and (b) one-dimensional cross section of the G2, G3 and G4 output beam.
Fig. 4. Illustration of a large-aperture tiled grating seam in the SG-II compression chamber.
Fig. 5. (a) Simplified quartz tiled grating, (b) normal incidence beam transmission field (normalized intensity) and (c) phase distribution of tiled and monolithic gratings.
Fig. 6. Phase jump with growing area width.
Fig. 7. Structure of typical gratings used in the study: (a) Au-coated grating and (b) multilayer dielectric grating.
Fig. 8. Phase distribution in the seams of the tiled Au-coated and tiled multilayer dielectric gratings.
Fig. 9. Phase jump in the tiled grating seams affected by the remaining slit thickness, where a 0-nm remaining thickness indicates that the seam was fully etched, whereas 380 nm implies no etching was applied to the seams.
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