Effects of Substrate Temperature and Ion Source Energy on Stress of Thin Film

Hao Shuai; Cui Bifeng; Fang Tianxiao; Wang Yang

doi:10.3788/lop55.093101

[1] Xu P, Zhang M. Current status of research on measurement of the stress in thin film［J］. Science Mosaic, 2006(12): 125-126.

[2] Zhao Y J, Huang T C, Shen W D, et al. Effect of ion assisted deposition on the stress of TiO2 thin films［J］. Journal of Zhejiang University (Engineering Science), 2005, 39(11): 1816-1818.

[3] Xu J, Chen L X, You X H, et al. Thermal stress damage of thin-film components induced by surface impurities［J］. Acta Optica Sinica, 2017, 37(6): 0614003.

[4] Nishikawa T, Ono H, Murotani H, et al. Analysis of long-term internal stress and film structure of SiO2 optical thin films［J］. Applied Optics, 2011, 50(9): C210.

[5] Lee C C, Chen H C, Jaing C C. Investigation of thermal annealing of optical properties and residual stress of ion-beam-assisted TiO2 thin films with different substrate temperatures［J］. Applied Optics, 2006, 45(13): 3091-3096.

[6] Robic J Y, Leplan H, Pauleau Y, et al. Residual stress in silicon dioxide thin films produced by ion-assisted deposition［J］. Thin Solid Films, 1996, 290/291: 34-39.

[7] Xiong S M, Zhang Y D, Tang J F. The stress properties of oxide thin films prepared by reactive electron beam evaporation［J］. Opto-Electronic Engineering, 2001, 28(1): 13-15.

[8] Gu P F, Zheng Z R, Zhao Y J, et al. Study on the mechanism and measurement of stress of TiO2 and SiO2 thin-films［J］. Acta Physica Sinica, 2006, 55(12): 6459-6463.

[9] Zhang J S, Zhang J L, Ning Y Q. Study of SiO2 dielectric film stress grown by the method of ion assisted deposition［J］. Chinese Journal of Luminescence, 2012, 33(12): 1304-1308.

[10] Chen T, Luo C T, Wang D S, et al. Stress distributions of titanium oxide film grown by electron-beam evaporation［J］. Chinese Journal of Vacuum Science and Technology, 2007, 27(2): 168-171.

[11] Li C A, Yang M D, Quan B Q, et al. Stress simulation analysis of multilayer films deposition［J］. Laser & Optoelectronics Progress, 2018, 55(4): 043101.

[12] Gries T, Vandenbulc L, Simon P, et al. Polarized micro-Raman spectroscopy for studying stresses in As-grown and tensile tested diamond films［J］. Surface and Coatings Technology, 2008, 202(11): 2263-2267.

[13] Tsyganov I, Maitz M F, Wiesser E, et al. Structure and properties of titanium oxide layers prepared by metal plasma immersion ion implantation and deposition［J］. Surface and Coatings Technology, 2003, 174/175: 591-596.

[14] Lee C C, Chen H C, Jaing C C. Effect of thermal annealing on the optical properties and residual stress of TiO2 films produced by ion-assisted deposition［J］. Applied Optics, 2005, 44(15): 2996-3000.

[15] Murotani H, Arai K, Wakaki M. Time dependence of internal stress and optical characteristics of SiO2 optical thin film［J］. Proceedings of SPIE, 2007, 6469: 646905.

[16] Ligot J , Welzel U, Lamparter P, et al. Stress analysis of polycrystalline thin films and surface regions by X-ray diffraction［J］. Journal of Applied Crystallography, 2005, 38(1): 1-29.

[17] Zhao Z W, Tay B K, Yu G Q. Room-temperature deposition of amorphous titanium dioxide thin film with high refractive index by a filtered cathodic vacuum arc technique［J］. Applied Optics, 2004, 43(6): 1281-1285.

[18] Yuan W J, Shen W D, Zheng X W, et al. Optical and mechanical properties and microstructures of Nb2O5, Ta2O2 and SiO2 thin film prepare by ion beam sputtering［J］. Acta Optica Sinica, 2017, 37(12): 1231001.

[19] Guo J L, Liu X F, Zhao Y A, et al. Effect of substrates crystalline structure on crystalline and mechanical properties of HfO2 thin films［J］. Chinese Journal of Lasers, 2016, 43(6): 0603001.

[20] Dong M J, Zhang L, Wang D S, et al. Study on stress in edge optical filters［J］. Aerospace Materials and Technology, 2015(1): 14-17.

[21] Chen T, Luo C T. The research progress of thin film stress［J］. Vacuum and Cryogenics, 2006, 12(2): 68-74.

[22] Fan R Y, Fan Z X. Stress analysis of films and some testing results［J］. Optical Instruments, 2001, 23(5/6): 84-91.

[23] Shao S Y, Tian G L, Fan Z X, et al. Influences of the deposition parameters and aging time on the residual stress of SiO2 films［J］. Acta Optica Sinica, 2005, 25(1): 126-130.